Phys. Rev. B 49, 4902 (1994) - X-ray-reflectivity study of the growth kinetics of vapor-deposited silver films

X-ray-reflectivity study of the growth kinetics of vapor-deposited silver films

C. Thompson, G. Palasantzas, Y. P. Feng, S. K. Sinha, and J. Krim

Phys. Rev. B 49, 4902 – Published 15 February 1994

Abstract

X-ray-reflectivity measurements have been carried out on silver films which were vapor deposited onto silicon substrates, to investigate the thickness evolution of the film’s surface roughness. The growth exponent was found to be β=0.26±0.05, and the roughness exponenet was found to be H=0.70±0.10.

Received 5 August 1993

DOI:https://doi.org/10.1103/PhysRevB.49.4902

©1994 American Physical Society

Authors & Affiliations

Physics Department, Polytechnic University, 333 Jay Street, Brooklyn, New York 11201

Physics Department, Northeastern University, Boston, Massachusetts 02115

Y. P. Feng and S. K. Sinha

Exxon Corporate Research Laboratories, Route 22E, Clinton Township, Annandale, New Jersey 08801

Physics Department, Northeastern University, Boston, Massachusetts 02115

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Vol. 49, Iss. 7 — 15 February 1994

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