Angle-resolved photoemission studies of epitaxial Ag films on Si(111)-(7×7)

A. L. Wachs, T. Miller, and T.-C. Chiang
Phys. Rev. B 29, 2286 – Published 15 February 1984
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Abstract

A 16-Å Ag film (about 7 atomic layers) grown epitaxially on Si(111)-(7×7) at about 100°C was studied by angle-resolved photoemission over a wide photon-energy range. Spectra taken of the well-ordered, smooth film showed sharp d-band peaks characteristic of single-crystal Ag(111), and a sharp peak derived from a surface state of Ag(111) in the band gap at point L. The bulk valence-band dispersions of Ag were reevaluated.

  • Received 18 October 1983

DOI:https://doi.org/10.1103/PhysRevB.29.2286

©1984 American Physical Society

Authors & Affiliations

A. L. Wachs, T. Miller, and T.-C. Chiang

  • Department of Physics and Materials Research Laboratory, University of Illinois at Urbana—Champaign, Urbana, Illinois 61801

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Issue

Vol. 29, Iss. 4 — 15 February 1984

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