Electronic structure of steps on silicon (111) surfaces from theoretical studies of finite clusters

A. Redondo, W. A. Goddard, III, and T. C. McGill
Phys. Rev. B 24, 6135 – Published 15 November 1981
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Abstract

Generalized valence-bond and configuration-interaction calculations were carried out for models of the steps on (111) surfaces. A characteristic of the step is a divalent Si atom adjacent to a trivalent surface Si atom. The result is three localized electronic states separated by less than 0.3 eV. These states have quite different electronic structure than the surface dangling bond, and they are expected to be reactive toward a large range of chemical species.

  • Received 1 June 1981

DOI:https://doi.org/10.1103/PhysRevB.24.6135

©1981 American Physical Society

Authors & Affiliations

A. Redondo*, W. A. Goddard, III, and T. C. McGill

  • Arthur Amos Noyes Laboratory of Chemical Physics and Harry G. Steele Laboratory of Electrical Sciences, California Institute of Technology, Pasadena, California 91125

  • *On leave from Departamento de Fisica, Universidad de Los Andes, Merida, Venezuela.

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Vol. 24, Iss. 10 — 15 November 1981

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