Proton spin-lattice relaxation in plasma-deposited amorphous silicon-hydrogen films

Jeffrey A. Reimer, Robert W. Vaughan, and John C. Knights
Phys. Rev. B 23, 2567 – Published 15 March 1981
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Abstract

Proton spin-lattice relaxation data are presented for several plasma-deposited amorphous silicon-hydrogen films when (i) homonuclear dipolar interactions are suppressed, (ii) deuterium is isotopically substituted for hydrogen, and (iii) films are annealed. These data are consistent with a model in which proton nuclei are relaxed by hydrogen-containing disorder modes. Analysis of these data shows that the density of disorder modes is ∼30% higher in the low-hydrogen-density domain and that more than one hydrogen nucleus is associated with each disorder mode. The behavior of T1 upon annealing indicates that a small fraction of unpaired spins or "dangling bonds" may be associated with disorder modes. These results suggest that the role of hydrogen in amorphous silicon is more complex than passivation of dangling-bond intrinsic defects.

  • Received 22 September 1980

DOI:https://doi.org/10.1103/PhysRevB.23.2567

©1981 American Physical Society

Authors & Affiliations

Jeffrey A. Reimer* and Robert W. Vaughan

  • Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California 91125

John C. Knights

  • Xerox Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto, California 94304

  • *Current address: IBM T. J. Watson Research Center, Yorktown Heights, N. Y. 10598.
  • Deceased.

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Vol. 23, Iss. 6 — 15 March 1981

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