Temperature dependence of the relative integrated intensities of symmetry-allowed phonon-assisted exciton emission in Si and Ge

D. L. Smith and T. C. McGill
Phys. Rev. B 14, 2448 – Published 15 September 1976
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Abstract

A model in which we interpret the observed temperature dependence of the relative intensities of symmetryallowed phonon-assisted exciton emission in Si and Ge is developed. The model is based on a splitting of the exciton ground state combined with different transition rates for the split exciton levels. Symmetry arguments are applied to reduce the relative transition rates for the various phonon-assisted transitions to a minimum number of parameters involving products of reduced matrix elements and energy denominators. If the parameters are determined by comparison with experiment, good quantitative agreement is achieved.

  • Received 22 December 1975

DOI:https://doi.org/10.1103/PhysRevB.14.2448

©1976 American Physical Society

Authors & Affiliations

D. L. Smith and T. C. McGill*

  • California Institute of Technology, Pasadena, California 91125

  • *Work supported in part by the Alfred P. Sloan Foundation.

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Vol. 14, Iss. 6 — 15 September 1976

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