Abstract
A new method for the measurement of loss factor for an rf cavity is presented. The method consists of measuring the above quantity by means of the detection of both the rf voltage induced by an electron bunch in the device under test and the bunch charge. The device to be investigated is a copper reentrant T-shaped cavity. The experimental results and their comparison with analytical and numerical results are presented.
- Received 20 June 2000
DOI:https://doi.org/10.1103/PhysRevSTAB.3.112001
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