• Open Access

Simple method for generating adjustable trains of picosecond electron bunches

P. Muggli, B. Allen, V. E. Yakimenko, J. Park, M. Babzien, K. P. Kusche, and W. D. Kimura
Phys. Rev. ST Accel. Beams 13, 052803 – Published 20 May 2010

Abstract

A simple, passive method for producing an adjustable train of picosecond electron bunches is demonstrated. The key component of this method is an electron beam mask consisting of an array of parallel wires that selectively spoils the beam emittance. This mask is positioned in a high magnetic dispersion, low beta-function region of the beam line. The incoming electron beam striking the mask has a time/energy correlation that corresponds to a time/position correlation at the mask location. The mask pattern is transformed into a time pattern or train of bunches when the dispersion is brought back to zero downstream of the mask. Results are presented of a proof-of-principle experiment demonstrating this novel technique that was performed at the Brookhaven National Laboratory Accelerator Test Facility. This technique allows for easy tailoring of the bunch train for a particular application, including varying the bunch width and spacing, and enabling the generation of a trailing witness bunch.

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  • Received 12 February 2010

DOI:https://doi.org/10.1103/PhysRevSTAB.13.052803

This article is available under the terms of the Creative Commons Attribution 3.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

Authors & Affiliations

P. Muggli* and B. Allen

  • University of Southern California, Los Angeles, California 90089, USA

V. E. Yakimenko, J. Park, M. Babzien, and K. P. Kusche

  • Brookhaven National Laboratory, Upton, Long Island, New York 11973, USA

W. D. Kimura

  • STI Optronics, Inc., Bellevue, Washington 98004, USA

  • *muggli@usc.edu

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Vol. 13, Iss. 5 — May 2010

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