Fractional Stoichiometry of the GaAs(001) c(4×4) Surface: An In-Situ X-Ray Scattering Study

M. Sauvage-Simkin, R. Pinchaux, J. Massies, P. Calverie, N. Jedrecy, J. Bonnet, and I. K. Robinson
Phys. Rev. Lett. 62, 563 – Published 30 January 1989
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Abstract

Synchrotron x-ray diffraction analysis of GaAs(001) epilayers grown in situ by molecular-beam epitaxy shows clear evidence of As-As dimers on top of the outermost As layer. These dimers are ordered in a variable way between two structures which both show a c(4×4) symmetry but have different As content. Both structures have twofold symmetry although the unit cell is square.

  • Received 16 May 1988

DOI:https://doi.org/10.1103/PhysRevLett.62.563

©1989 American Physical Society

Authors & Affiliations

M. Sauvage-Simkin*, R. Pinchaux, J. Massies, P. Calverie§, N. Jedrecy, J. Bonnet, and I. K. Robinson

  • Laboratoire pour l'Utilisation du Rayonnement Electromagnétique (LURE), Bâtiment 209D, Université Paris-Sud, F-91405 Orsay, CEDEX, France

  • *Also at Laboratoire de Minéralogie-Cristallographie, 4 place Jussieu, F-75252 Paris, CEDEX, France.
  • Also at Université P. et M. Curie, 4 place Jussieu, F-75252 Paris, CEDEX, France.
  • Also at Laboratoire de Physique du Solide et Energie Solaire, F-06950 Valbonne, France.
  • §Present address: K. K. L'Air Liquide Laboratories, 5-9-9 Tokodai, Toyosako-Machi, Tsukuba-gun, IBARAKI-Pref, 300-25, Japan.
  • Permanent address, AT&T Bell Laboratories, Murray Hill, New Jersey 07974.

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Vol. 62, Iss. 5 — 30 January 1989

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