Rapid Melting and Regrowth Velocities in Silicon Heated by Ultraviolet Picosecond Laser Pulses

Philip H. Bucksbaum and Jeffrey Bokor
Phys. Rev. Lett. 53, 182 – Published 9 July 1984
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Abstract

Direct measurements of the silicon liquid/solid interface velocity have been made during both melt-in and regrowth for crystalline silicon irradiated with a pulsed (15 psec) ultraviolet laser. The liquid films produced were up to 40 nm thick and were fully amorphized upon resolidification. Above threshold, the regrowth velocity was 25 m/sec, independent of laser fluence. The results imply a nonlinear relationship between supercooling and interface velocity.

  • Received 10 January 1984

DOI:https://doi.org/10.1103/PhysRevLett.53.182

©1984 American Physical Society

Authors & Affiliations

Philip H. Bucksbaum

  • AT&T Bell Laboratories, Murray Hill, New Jersey 07974

Jeffrey Bokor

  • AT&T Bell Laboratories, Holmdel, New Jersey 07733

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Vol. 53, Iss. 2 — 9 July 1984

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