Origins of Structural Hole Traps in Hydrogenated Amorphous Silicon

Eric Johlin, Lucas K. Wagner, Tonio Buonassisi, and Jeffrey C. Grossman
Phys. Rev. Lett. 110, 146805 – Published 5 April 2013
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Abstract

The inherently disordered nature of hydrogenated amorphous silicon (a-Si:H) obscures the influence of atomic features on the trapping of holes. To address this, we have created a set of over two thousand ab initio structures of a-Si:H and explored the influence of geometric factors on the occurrence of deep hole traps using density-functional theory. Statistical analysis of the relative contribution of various structures to the trap distribution shows that floating bonds and ionization-induced displacements correlate most strongly with hole traps in our ensemble.

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  • Received 2 August 2012

DOI:https://doi.org/10.1103/PhysRevLett.110.146805

© 2013 American Physical Society

Authors & Affiliations

Eric Johlin1,*, Lucas K. Wagner2, Tonio Buonassisi1, and Jeffrey C. Grossman1,†

  • 1Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA
  • 2University of Illinois, Urbana, Illinois 61801, USA

  • *johlin@alum.mit.edu
  • jcg@mit.edu

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Issue

Vol. 110, Iss. 14 — 5 April 2013

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