Interface orbital engineering of large-gap topological states: Decorating gold on a Si(111) surface

Bing Huang, Kyung-Hwan Jin, Houlong L. Zhuang, Lizhi Zhang, and Feng Liu
Phys. Rev. B 93, 115117 – Published 9 March 2016
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Abstract

Intensive effort has recently been made in search of topological insulators (TIs) that have great potential in spintronics applications. In this paper, a novel concept of overlayer induced interfacial TI phase in conventional semiconductor surface is proposed. The first-principles calculations demonstrate that a p-band-element X (X=In, Bi, and Pb) decorated d-band surface, such as Au/Si(111) surface [X/Au/Si(111)] of an existing experimental system, offers a promising prototype for TIs. Specifically, Bi/Au/Si(111) and Pb/Au/Si(111) are identified to be large-gap TIs. A pd band inversion mechanism induced by growth of X in the Au/Si(111) surface is revealed to function at different coverage of X with different lattice symmetries, suggesting a general approach of interface orbital engineering of large-gap TIs via tuning the interfacial atomic orbital position of X relative to Au.

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  • Received 1 November 2015
  • Revised 28 January 2016

DOI:https://doi.org/10.1103/PhysRevB.93.115117

©2016 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Bing Huang1,2,*, Kyung-Hwan Jin2, Houlong L. Zhuang3, Lizhi Zhang2, and Feng Liu2,4,†

  • 1Beijing Computational Science Research Center, Beijing 100193, China
  • 2Department of Materials Science and Engineering, University of Utah, Salt Lake City, Utah 84112, USA
  • 3Department of Mechanical and Aerospace Engineering, Princeton University, Princeton, New Jersey 08544, USA
  • 4Collaborative Innovation Center of Quantum Matter, Beijing 100084, China

  • *Bing.Huang@csrc.ac.cn
  • fliu@eng.utah.edu

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Issue

Vol. 93, Iss. 11 — 15 March 2016

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