Impact of the modulation doping layer on the ν=5/2 anisotropy

X. Shi, W. Pan, K. W. Baldwin, K. W. West, L. N. Pfeiffer, and D. C. Tsui
Phys. Rev. B 91, 125308 – Published 30 March 2015

Abstract

We have carried out a systematic study of the tilted magnetic field induced anisotropy at the Landau level filling factor ν=5/2 in a series of high quality GaAs quantum wells, where the setback distance (d) between the modulation doping layer and the GaAs quantum well is varied from 33 to 164 nm. We have observed that in the sample of the smallest d, electronic transport is anisotropic when the in-plane magnetic field (Bip) is parallel to the [110] crystallographic direction, but remains more or less isotropic when Bip[110]. In contrast, in the sample of largest d, electronic transport is anisotropic in both crystallographic directions. Our results clearly show that the modulation doping layer plays an important role in the tilted field induced ν=5/2 anisotropy.

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  • Received 20 December 2014
  • Revised 13 March 2015

DOI:https://doi.org/10.1103/PhysRevB.91.125308

©2015 American Physical Society

Authors & Affiliations

X. Shi1, W. Pan1, K. W. Baldwin2, K. W. West2, L. N. Pfeiffer2, and D. C. Tsui2

  • 1Sandia National Labs, Albuquerque, New Mexico 87185, USA
  • 2Princeton University, Princeton, New Jersey 08544, USA

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Issue

Vol. 91, Iss. 12 — 15 March 2015

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