Electronic structure of LiCoO2 thin films: A combined photoemission spectroscopy and density functional theory study

David Ensling, Andreas Thissen, Stefan Laubach, Peter C. Schmidt, and Wolfram Jaegermann
Phys. Rev. B 82, 195431 – Published 16 November 2010

Abstract

The electronic properties of LiCoO2 have been studied by theoretical band-structure calculations (using density functional theory) and experimental methods (photoemission). Synchrotron-induced photoelectron spectroscopy, resonant photoemission spectroscopy (ResPES), and soft x-ray absorption (XAS) have been applied to investigate the electronic structure of both occupied and unoccupied states. High-quality PES spectra were obtained from stoichiometric and highly crystalline LiCoO2 thin films deposited “in situ” by rf magnetron sputtering. An experimental approach of separating oxygen- and cobalt-derived (final) states by ResPES in the valence-band region is presented. The procedure takes advantage of an antiresonant behavior of cobalt-derived states at the 3p3d excitation threshold. Information about the unoccupied density of states has been obtained by OK XAS. The structure of the CoL absorption edge is compared to semiempirical charge-transfer multiplet calculations. The experimental results are furthermore compared with band-structure calculations considering three different exchange potentials [generalized gradient approximation (GGA), using a nonlocal Hubbard U (GGA+U) and using a hybrid functional (Becke, three-parameter, Lee-Yang-Parr [B3LYP])]. For these different approaches total density of states and partial valence-band density of states have been investigated. The best qualitative agreement with experimental results has been obtained by using a GGA+U functional with U=2.9eV.

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  • Received 6 December 2009

DOI:https://doi.org/10.1103/PhysRevB.82.195431

©2010 American Physical Society

Authors & Affiliations

David Ensling1,2,*, Andreas Thissen1,3, Stefan Laubach4, Peter C. Schmidt4, and Wolfram Jaegermann1

  • 1Fachbereich Materialwissenschaften, Fachgebiet Oberflächenforschung, Technische Universität Darmstadt, Petersenstraße 23, D-64287 Darmstadt, Germany
  • 2VARTA Microbattery GmbH, Daimlerstrasse 1, D-73479 Ellwangen, Germany
  • 3SPECS GmbH, Voltastrasse 5, D-13355 Berlin, Germany
  • 4Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Petersenstraße 21, D-64287 Darmstadt, Germany

  • *Corresponding author; david.ensling@gmail.com

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Issue

Vol. 82, Iss. 19 — 15 November 2010

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