Magnetization reorientation in GaxMn1xAs films: Planar Hall effect measurements

Sunjae Chung, Sanghoon Lee, X. Liu, and J. K. Furdyna
Phys. Rev. B 81, 155209 – Published 19 April 2010

Abstract

The process of magnetization reorientation in a ferromagnetic semiconductor GaMnAs films was investigated using planar Hall effect measurements. In addition to the well-known two-step switching behavior that occurs during this process, we have observed two additional distinct features in field scan data of the planar Hall resistance (PHR). First, the region of the external field required to begin and complete the reorientation of magnetization from one easy axis to another strongly depends on the direction of the applied field. And second, the maximum amplitude of PHR is significantly reduced during magnetization reversal when the applied field is oriented near one of the easy axes of the GaMnAs film. We provide an explanation of these phenomena using the magnetic field dependence of the free-energy density and assuming the coexistence of multiple domains with three different directions of magnetization in the sample.

  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Received 26 November 2009

DOI:https://doi.org/10.1103/PhysRevB.81.155209

©2010 American Physical Society

Authors & Affiliations

Sunjae Chung and Sanghoon Lee*

  • Physics Department, Korea University, Seoul 136-701, Korea

X. Liu and J. K. Furdyna

  • Physics Department, University of Notre Dame, Notre Dame, Indiana 46556, USA

  • *slee3@korea.ac.kr

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 81, Iss. 15 — 15 April 2010

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×