Ab initio theory of gate induced gaps in graphene bilayers

Hongki Min, Bhagawan Sahu, Sanjay K. Banerjee, and A. H. MacDonald
Phys. Rev. B 75, 155115 – Published 25 April 2007

Abstract

We study the gate-voltage induced gap that occurs in graphene bilayers using ab initio density functional theory. Our calculations confirm the qualitative picture suggested by phenomenological tight-binding and continuum models. We discuss enhanced screening of the external interlayer potential at small gate voltages, which is more pronounced in the ab initio calculations, and quantify the role of crystalline inhomogeneity using a tight-binding model self-consistent Hartree calculation.

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  • Received 9 December 2006

DOI:https://doi.org/10.1103/PhysRevB.75.155115

©2007 American Physical Society

Authors & Affiliations

Hongki Min1,*, Bhagawan Sahu2, Sanjay K. Banerjee2, and A. H. MacDonald1

  • 1Department of Physics, The University of Texas at Austin, Austin, Texas 78712, USA
  • 2Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, USA

  • *Electronic address: hongki@physics.utexas.edu

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Issue

Vol. 75, Iss. 15 — 15 April 2007

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