5-7-5 line defects on AsSi(100): A general stress-relief mechanism for V/IV surfaces

W. E. McMahon, Iskander G. Batyrev, T. Hannappel, J. M. Olson, and S. B. Zhang
Phys. Rev. B 74, 033304 – Published 6 July 2006

Abstract

An entire family of nano-scale trenches, ridges, and steps has been observed experimentally on AsH3-exposed Si(100). Some of these line structures have been observed previously, but their structures have remained a mystery. Theoretical modeling shows that they are all based upon the same stress-relieving 5-7-5 core structure. The strong similarities between line structures on AsSi(100), PSi(100), AsGe(100), and other V/IV surfaces lead to a much broader conclusion: 5-7-5 line structures are a general form of stress relief for group-V terminated Si and Ge surfaces.

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  • Received 24 April 2006

DOI:https://doi.org/10.1103/PhysRevB.74.033304

©2006 American Physical Society

Authors & Affiliations

W. E. McMahon1, Iskander G. Batyrev1,2, T. Hannappel1,3, J. M. Olson1, and S. B. Zhang1

  • 1National Renewable Energy Laboratory, Golden, Colorado 80401, USA
  • 2Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235, USA
  • 3Hahn-Meitner Institute, Solar Energy (SE-4), Glienicker Stresse 100, Berlin D-14109, Germany

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Issue

Vol. 74, Iss. 3 — 15 July 2006

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