Adsorption and reaction processes of physisorbed molecular oxygen on Si(111)-(7×7)

Kazuyuki Sakamoto, H. M. Zhang, and R. I. G. Uhrberg
Phys. Rev. B 72, 075346 – Published 18 August 2005

Abstract

The adsorption and reaction processes of physisorbed oxygen molecules on a Si(111)-(7×7) surface have been investigated using time-resolved O 1s core-level photoemission measurements at 45 K. Physisorbed oxygen molecules are only observed at 45 K and lower temperatures on a Si(111)-(7×7) surface. At the dosage when the dangling bonds are saturated by chemisorbed oxygen, the coverage of the physisorbed species increases drastically. This result indicates that oxygen species, which are chemisorbed on top of adatoms, modifies the potential energy curve for an oxygen molecule approaching the surface such that physisorbed oxygen molecules are stabilized. Further, the longer lifetime at a higher dosage indicates that an intermolecular force plays a role for the stabilization of this species. Taking these results into account, an oxidation stage-dependent gas-surface interaction for an oxygen molecule approaching the Si(111) surface is suggested.

    • Received 16 November 2004

    DOI:https://doi.org/10.1103/PhysRevB.72.075346

    ©2005 American Physical Society

    Authors & Affiliations

    Kazuyuki Sakamoto1,*, H. M. Zhang2, and R. I. G. Uhrberg2

    • 1Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan
    • 2Department of Physics and Measurement Technology, Linköping University, S-581 83 Linköping, Sweden

    • *Electronic address: sakamoto@surface.phys.tohoku.ac.jp

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    Issue

    Vol. 72, Iss. 7 — 15 August 2005

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