Electron delocalization in disordered films induced by magnetic field and film thickness

R. K. Brojen Singh and Deepak Kumar
Phys. Rev. B 69, 115420 – Published 22 March 2004
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Abstract

We have studied the delocalization transition of noninteracting electrons in disordered thin films induced by magnetic field and film thickness. We also report results for two-dimensional systems. We have used for this purpose (i) a numerical technique based on transfer-matrix method for quasi-one-dimensional systems; (ii) self-consistent theory of localization for weak fields generalized to situations lacking time-reversal invariance. Numerical results provide strong evidence for a zero-temperature insulator-to-metal transition (MIT) with both field and film thickness. In self-consistent theory we adopt two procedures which give different results on MIT induced by field, temperature, and thickness. The variance between numerical and analytical results is analyzed.

  • Received 9 September 2003

DOI:https://doi.org/10.1103/PhysRevB.69.115420

©2004 American Physical Society

Authors & Affiliations

R. K. Brojen Singh and Deepak Kumar

  • School of Physical Sciences, Jawaharlal Nehru University, New Delhi 110067, India

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Vol. 69, Iss. 11 — 15 March 2004

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