Negative electron affinity material: LaS on InP

O. Eriksson, M. Cahay, and J. M. Wills
Phys. Rev. B 65, 033304 – Published 11 December 2001
PDFExport Citation

Abstract

Rare-earth monosulfides are shown to offer attractive alternatives to the commonly used cesiated surfaces to reach negative electron affinity at various III-V semiconductor surfaces. This is illustrated by theoretical calculations of metallic overlayers of LaS on a semiconducting InP substrate using first-principles techniques. The combination of these materials is demonstrated to result in a very low work function (0.8 eV). The interface between the LaS overlayer/InP substrate is shown to be quite stable, and the lattice relaxation of the surface atoms and the atoms at the interface is found to be small.

  • Received 20 April 2001

DOI:https://doi.org/10.1103/PhysRevB.65.033304

©2001 American Physical Society

Authors & Affiliations

O. Eriksson1, M. Cahay2, and J. M. Wills3

  • 1Department of Physics, Uppsala University, Box 530, Uppsala, Sweden
  • 2Department of Electrical and Computer Engineering and Computer Science, University of Cincinnati, Cincinnati, Ohio 45221
  • 3Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545

References (Subscription Required)

Click to Expand
Issue

Vol. 65, Iss. 3 — 15 January 2002

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×