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Ballistic-carrier spectroscopy of the CoSi2/Si interface

W. J. Kaiser, M. H. Hecht, R. W. Fathauer, L. D. Bell, E. Y. Lee, and L. C. Davis
Phys. Rev. B 44, 6546(R) – Published 15 September 1991
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Abstract

Ballistic-electron-emission microscopy and related ballistic-hole and carrier-scattering spectroscopies have been used to investigate carrier transport in the epitaxial CoSi2/Si system. An unexpected degree of variation in interface transmission is observed despite the high crystal quality of the epitaxial silicide layer. Furthermore, clear evidence of the CoSi2 band structure is observed, which has a dramatic effect on interface transport. The major effect of the silicide band structure is to increase the interfacial barrier to electron transmission to a value in excess of the Schottky barrier height.

  • Received 24 May 1991

DOI:https://doi.org/10.1103/PhysRevB.44.6546

©1991 American Physical Society

Authors & Affiliations

W. J. Kaiser, M. H. Hecht, R. W. Fathauer, and L. D. Bell

  • Center for Space Microelectronics Technology, Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California 91109

E. Y. Lee

  • Department of Physics and Center for Integrated Electronics, Rensselaer Polytechnic Institute, Troy, New York 12180

L. C. Davis

  • Scientific Research Staff, Ford Motor Compony, Dearborn, Michigan 48121

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Issue

Vol. 44, Iss. 12 — 15 September 1991

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