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Low-coverage alkali-metal-induced surface structural changes in III-V semiconductors: Photoemission extended x-ray-absorption fine-structure study of the Na/InP(110) interface

K. M. Choudhary, P. S. Mangat, H. I. Starnberg, Z. Hurych, D. Kilday, and P. Soukiassian
Phys. Rev. B 39, 759(R) – Published 1 January 1989
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Abstract

The atomic geometries of Na/InP(110) interfaces have been studied by photoemission extended x-ray-absorption fine-structure experiments. At low (18 monolayer) sodium coverage for room-temperature metal deposition, adatom-induced structural change within the surface unit mesh (reconstruction) of the substrate is found, as previously demonstrated for alkali-metal-covered transition-metal surfaces, while the relaxation in the unit mesh of the InP(110) surface is removed. The reconstruction is a change in the in-plane P—In bond length within the surface unit mesh. In the very low alkali-metal coverage regime, these surface structural changes are likely to influence Fermi-level pinning reported for very low coverages of alkali metals on (110) faces of InP and some other important III-V semiconductors.

  • Received 8 July 1988

DOI:https://doi.org/10.1103/PhysRevB.39.759

©1989 American Physical Society

Authors & Affiliations

K. M. Choudhary and P. S. Mangat

  • University of Notre Dame, Materials Science and Engineering, Notre Dame, Indiana 46556

H. I. Starnberg and Z. Hurych

  • Department of Physics, Northern Illinois University, De Kalb, Illinois 60115

D. Kilday

  • Synchrotron Radiation Center and Department of Physics, University of Wisconsin—Madison, Stoughton, Wisconsin 53589

P. Soukiassian*

  • Commissariat à l'Energie Atomique, Service de Physique des Atomes et des Surfaces, Centre d'Études Nucléaires de Saclay, 91191 Gif-sur-Yvette Cedex, France and Départment de Physique, Universite de Paris-Sud, 91405 Orsay Cedex, France

  • *Also at Department of Physics, Northern Illinois University, De Kalb, IL 60115.

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Vol. 39, Iss. 1 — 1 January 1989

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