Carrier confinement potential in quantum-well wires fabricated by implantation-enhanced interdiffusion in the GaAs-Ga1xAlxAs system

J. Cibert and P. M. Petroff
Phys. Rev. B 36, 3243 – Published 15 August 1987
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Abstract

We compute the shape of the confinement potential resulting from the interdiffusion of a GaAs quantum well locally enhanced by defects due to gallium implantation. We use the simplest model taking into account the lateral diffusion of the defects. A variational calculation of the first two electronic levels within this two-dimensional potential supports the assignment of the recently observed new cathodoluminescence lines to electrons laterally confined in a graded potential.

  • Received 29 January 1987

DOI:https://doi.org/10.1103/PhysRevB.36.3243

©1987 American Physical Society

Authors & Affiliations

J. Cibert

  • Laboratoire de Spectrométrie Physique, Université Scientifique et Médicale de Grenoble, B.P.87, 38402 St. Martin d’Hères Cedex, France

P. M. Petroff

  • Materials Program and Department of Electrical Engineering, University of California, Santa Barbara, California 93106

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Vol. 36, Iss. 6 — 15 August 1987

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