Reply to comments on "Electronic effects on dislocation velocities in heavily doped silicon"

J. R. Patel and L. R. Testardi
Phys. Rev. B 15, 4124 – Published 15 April 1977
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Abstract

This reply to comments by Schröter, Labusch, and Haasen, rebuts the arguments put forward that our model to account for the electronic effects on dislocation velocity in semiconductors is basically unacceptable. We have clarified the basic differences between their model and ours and have suggested means for a possible critical test between the two models.

  • Received 15 October 1976

DOI:https://doi.org/10.1103/PhysRevB.15.4124

©1977 American Physical Society

Authors & Affiliations

J. R. Patel and L. R. Testardi

  • Bell Laboratories, Murray Hill, New Jersey 07974

Comments & Replies

Original Article

Electronic effects on dislocation velocities in heavily doped silicon

J. R. Patel, L. R. Testardi, and P. E. Freeland
Phys. Rev. B 13, 3548 (1976)

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Vol. 15, Iss. 8 — 15 April 1977

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