Metal-insulator transition in a doped semiconductor

T. F. Rosenbaum, R. F. Milligan, M. A. Paalanen, G. A. Thomas, R. N. Bhatt, and W. Lin
Phys. Rev. B 27, 7509 – Published 15 June 1983
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Abstract

Millikelvin measurements of the conductivity as a function of donor density and uniaxial stress in bulk samples of phosphorus-doped silicon establish that the transition from metal to insulator is continuous, but sharper than predicted by scaling theories of localization. The divergence of the dielectric susceptibility as the transition is approached from below also points out problems in current scaling theories. The temperature dependence of the conductivity and the magnetoresistance in the metal indicate the importance of Coulomb interactions in describing the behavior of disordered systems.

  • Received 3 December 1982

DOI:https://doi.org/10.1103/PhysRevB.27.7509

©1983 American Physical Society

Authors & Affiliations

T. F. Rosenbaum*, R. F. Milligan, M. A. Paalanen, G. A. Thomas, and R. N. Bhatt

  • Bell Laboratories, Murray Hill, New Jersey 07974

W. Lin

  • Bell Laboratories, Allentown, Pennsylvania 18104

  • *Present address: James Franck Institute, The University of Chicago, Chicago, IL 60637.
  • Present address: Muhlenberg College, Allentown, PA 18104.

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Vol. 27, Iss. 12 — 15 June 1983

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