Abstract
Today the porous silicon photonic crystals are widely used as components of the optical sensors. The structures with the resonance properties, e.g. a narrow reflection band, which provides high sensitivity of the device, generate considerable interest. One of the most interesting structures of this type are rugate filters. Rugate filter is a photonic crystal with a gradually varying under harmonic law index of refraction and narrow spectral reflection band. In this paper, we present our results of the optimization of silicon electrochemical etching parameters, in order to fabricate filters in a visible spectral range with reflection bandwidth of less than 30 nm and a reflectance higher than 80%.
Export citation and abstract BibTeX RIS
Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.