Impulse Plasma In Surface Engineering - a review

The article describes the view of the plasma surface engineering, assuming the role of non-thermal energy effects in the synthesis of materials and coatings deposition. In the following study it was underlined that the vapor excitation through the application of an electric field during coatings deposition gives new possibilities for coatings formation. As an example the IPD method was chosen. During the IPD (Impulse Plasma Deposition) the impulse plasma is generated in the coaxial accelerator by strong periodic electrical pulses. The impulse plasma is distributed in the form of energetic plasma pockets. Due to the almost completely ionization of gas, the nucleation of new phases takes place on ions directly in the plasma itself. As a result the coatings of metastable materials with nano-amorphous structure and excellent adhesion to the non-heated intentionally substrates could be deposited. Recently the novel way of impulse plasma generation during the coatings deposition was proposed and developed by our group. An efficient tool for plasma process control, the plasma forming gas injection to the interelectrode space was used. Periodic changing the gas pressure results in increasing both the degree of dispersion and the dynamics of the plasma pulses. The advantage of the new technique in deposition of coatings with exceptionally good properties has been demonstrated in the industrial scale not only in the case of the IPD method but also in the case of very well known magnetron sputtering method.