Photo-excitation intensity dependent electron and hole injections from lead iodide perovskite to nanocrystalline TiO2 and spiro-OMeTAD

Satoshi Makuta; Maning Liu; Masaru Endo; Hidetaka Nishimura; Atsushi Wakamiya; Yasuhiro Tachibana

doi:10.1039/C5CC06518F

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Photo-excitation intensity dependent electron and hole injections from lead iodide perovskite to nanocrystalline TiO₂ and spiro-OMeTAD†

Satoshi Makuta,‡^a Maning Liu,‡^a Masaru Endo,^b Hidetaka Nishimura,^b Atsushi Wakamiya^bc and Yasuhiro Tachibana*^acd

Author affiliations

* Corresponding authors

^a School of Aerospace, Mechanical and Manufacturing Engineering, RMIT University, Bundoora, VIC 3083, Australia
E-mail: yasuhiro.tachibana@rmit.edu.au

^b Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan

^c Japan Science and Technology Agency (JST), PRESTO, 4-1-8 Honcho Kawaguchi, Saitama 332-0012, Japan

^d Office for University-Industry Collaboration, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
E-mail: y.tachibana@uic.osaka-u.ac.jp

Abstract

Photo-excitation intensity dependent electron and hole injections from CH₃NH₃PbI₃ perovskite to nanocrystalline TiO₂ and spiro-OMeTAD are presented with the electron injection yield decrease from 95% to 10% and the hole injection yield decrease from 99% to 50% by increasing the excitation intensity from 10 nJ cm⁻² to 50 μJ cm⁻².

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Article information

DOI: https://doi.org/10.1039/C5CC06518F
Article type: Communication
Submitted: 04 Aug 2015
Accepted: 29 Oct 2015
First published: 29 Oct 2015

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Chem. Commun., 2016,52, 673-676

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Photo-excitation intensity dependent electron and hole injections from lead iodide perovskite to nanocrystalline TiO₂ and spiro-OMeTAD

S. Makuta, M. Liu, M. Endo, H. Nishimura, A. Wakamiya and Y. Tachibana, Chem. Commun., 2016, 52, 673 DOI: 10.1039/C5CC06518F

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