Issue 21, 2013

Hole-induced large-area homoepitaxial growth of CdSe nanowire arrays for photovoltaic application

Abstract

Traditionally, lattice-matched substrates are a requisite for the epitaxial growth of one-dimensional (1D) semiconductor nanostructure arrays, while the lack of suitable substrates seriously limits the nanowire (NW) arrays available for future nanoelectronic and nano-optoelectronics applications. In this work, we reported a new strategy for achieving the one-step homoepitaxial growth of highly aligned CdSe NW arrays by utilizing porous silicon as substrates. The porous Si with dense holes could promote the nucleation of CdSe micro-crystals at the early stage of vapor phase transport owing to its high surface energy. Subsequently, the epitaxial growth of CdSe NW arrays would take place on the top surfaces of the micro-crystals, resulting in large-area highly aligned NW arrays. As compared with the conventional epitaxial methods, the hole-induced method is greatly simplified because no lattice-matched substrates or catalysts are needed; furthermore, the universality of the proposed method was demonstrated for a variety of II–VI NW arrays. As a demonstration of the potential applications, preliminary studies on CdSe NW array/Si p–n heterojunction solar cells were shown with an efficiency of ∼0.43% under AM 1.5G illumination.

Graphical abstract: Hole-induced large-area homoepitaxial growth of CdSe nanowire arrays for photovoltaic application

Supplementary files

Article information

Article type
Paper
Submitted
22 Feb 2013
Accepted
22 Mar 2013
First published
25 Mar 2013

J. Mater. Chem. A, 2013,1, 6313-6319

Hole-induced large-area homoepitaxial growth of CdSe nanowire arrays for photovoltaic application

L. Bian, X. Zhang, C. Luan, J. A. Zapien, X. Zhang, Y. Wu and J. Jie, J. Mater. Chem. A, 2013, 1, 6313 DOI: 10.1039/C3TA10771J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements