Issue 6, 2013
From the journal:

Nanoscale

Fabrication of complex 3-dimensional patterned structures on a ∼10 nm scale from a single master pattern by secondary sputtering lithography†

Hwan-Jin Jeon,a   Hae-Wook Yoo,a   Eun Hyung Lee,a   Sung Woo Jang,a   Jong-Seon Kim,a   Jong Kil Choia  and  Hee-Tae Jung*a  

* Corresponding authors

a Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, Daejeon, Korea
E-mail: heetae@kaist.ac.kr
Fax: +82-42-350-3910
Tel: +82-42-350-3931

Abstract

We describe a highly efficient method for fabricating a variety of complex 3D nano-patterns from a single master pattern using secondary sputtering lithography, which is a 10 nm scale patterning method that we have developed. A rapid etching rate in the bottom part of the PS pillar during the RIE process can produce various nanostructure shapes and the PS residual layer thickness can influence various feature dimensions, due to the controlled RIE time leading to different PS layer thicknesses. This technique provides a highly effective method for producing various complex 3D patterns from a single master pattern. Thus, this method can serve as a new procedure for the cost-effective mass production of complex nanoscale patterns with high resolution.

Graphical abstract: Fabrication of complex 3-dimensional patterned structures on a ∼10 nm scale from a single master pattern by secondary sputtering lithography

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Article information

DOI
https://doi.org/10.1039/C3NR33739A
Article type
Paper
Submitted
20 Nov 2012
Accepted
14 Jan 2013
First published
17 Jan 2013

Nanoscale, 2013,5, 2358-2363

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Fabrication of complex 3-dimensional patterned structures on a ∼10 nm scale from a single master pattern by secondary sputtering lithography

H. Jeon, H. Yoo, E. H. Lee, S. W. Jang, J. Kim, J. K. Choi and H. Jung, Nanoscale, 2013, 5, 2358 DOI: 10.1039/C3NR33739A

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