Issue 16, 2013

Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds

Abstract

We present a process based on nanoimprint lithography for the fabrication of a microchannel mold having nanopatterns formed at the bottoms of its microchannels. A focused laser beam selectively cures the resist in the micrometer scale during nanoimprint lithography. Nanopatterns within the microchannels may be used to control microfluidic behavior.

Graphical abstract: Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds

Supplementary files

Article information

Article type
Communication
Submitted
13 Feb 2013
Accepted
07 Jun 2013
First published
07 Jun 2013

Lab Chip, 2013,13, 3188-3191

Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds

H. Lim, J. Ryu, G. Kim, K. Choi, S. Lee and J. Lee, Lab Chip, 2013, 13, 3188 DOI: 10.1039/C3LC50202C

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