Issue 48, 2008
From the journal:

Physical Chemistry Chemical Physics

Fully cross-linked and chemically patterned self-assembled monolayers

André Beyer,*a   Adelheid Godt,*b   Ihsan Amin,a   Christoph T. Nottbohm,a   Christian Schmidt,b   Jinkai Zhaob  and  Armin Gölzhäusera  

* Corresponding authors

a Universität Bielefeld, Fakultät für Physik, Physik Supramolekularer Systeme, Postfach 10 01 31, Bielefeld, Germany
E-mail: beyer@physik.uni-bielefeld.de

b Universität Bielefeld, Fakultät für Chemie, Organische Chemie, Postfach 10 01 31, Bielefeld, Germany
E-mail: godt@uni-bielefeld.de

Abstract

Mechanically stable monolayers with chemically functional patterns are fabricated by the combination of spatially resolved chemical lithography with complete cross-linking of aromatic self-assembled monolayers (SAMs). The process starts with a local electron exposure of a SAM of 4′-nitro-1,1′-biphenyl-4-thiol that converts the nitro into amino groups and, additionally, generates a pattern of cross-linked and non cross-linked regions. In the next step, molecules in the non cross-linked regions are exchanged for 1,1′-biphenyl-4-thiol. A subsequent electron exposure cross-links these regions, yielding a fully cross-linked, chemically patterned SAM. The reverse process that generates chemically complementary patterns is also demonstrated. For both processes, X-ray photoelectron spectroscopy and atomic force microscopy are used to monitor the fabrication steps and to determine the kinetics of the thiol exchange. The functionality of the fully cross-linked, chemically patterned monolayer is tested by the site selective derivatisation with pentanoic acid chloride.

Graphical abstract: Fully cross-linked and chemically patterned self-assembled monolayers

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Article information

DOI
https://doi.org/10.1039/B809787A
Article type
Paper
Submitted
10 Jun 2008
Accepted
18 Aug 2008
First published
28 Oct 2008

Phys. Chem. Chem. Phys., 2008,10, 7233-7238

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Fully cross-linked and chemically patterned self-assembled monolayers

A. Beyer, A. Godt, I. Amin, C. T. Nottbohm, C. Schmidt, J. Zhao and A. Gölzhäuser, Phys. Chem. Chem. Phys., 2008, 10, 7233 DOI: 10.1039/B809787A

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