Issue 5, 2003
From the journal:

New Journal of Chemistry

New insights on the anti-skinning effect of methyl ethyl ketoxime in alkyd paints

Stefania Tanase,a   Jean-Cyrille Hierso,a   Elisabeth Bouwman,*a   Jan Reedijk,a   Jan ter Borg,b   Johan H. Bielemanb  and  Arno Schutb  

* Corresponding authors

a Leiden Institute of Chemistry, Gorlaeus Laboratories, Leiden University, PO Box 9502, Leiden, The Netherlands
E-mail: bouwman@chem.leidenuniv.nl
Fax: +31 71 527 4451
Tel: +31 71 527 4550

b Sasol Servo BV, PO Box 1, Delden, The Netherlands

Abstract

In order to shed light on the role of oxime additives as blocking agents of the cobalt-catalyzed autoxidative drying in alkyd paints, various techniques have been applied. Spectroscopic studies (Vis-NIR, 1H NMR) of different model solutions show, together with investigations on the coordination chemistry of cobalt salts with oximes, that only weak interactions between cobalt and oximes can be evidenced; in several cases the residual water that is present is a stronger ligand than oximes for the cobalt ion. From CoCl2 and methyl ethyl ketoxime (meko) the highly unstable complex [Co(meko)Cl2]n has been isolated. The polymerization inhibition properties of different oximes were studied by TR-FTIR and SEC techniques. From EPR and GC-MS model experiments, it has been established that the free radicals formed in the coating compositon may readily add to the C[double bond, length as m-dash]N double bond of the oxime, producing stable radical addition products that could inhibit further free radical chain reactions.

Graphical abstract: New insights on the anti-skinning effect of methyl ethyl ketoxime in alkyd paints

About
Cited by
Related
Download options Please wait...

Article information

DOI
https://doi.org/10.1039/B211236A
Article type
Paper
Submitted
13 Nov 2002
Accepted
22 Jan 2003
First published
10 Apr 2003

New J. Chem., 2003,27, 854-859

Permissions

Request permissions

New insights on the anti-skinning effect of methyl ethyl ketoxime in alkyd paints

S. Tanase, J. Hierso, E. Bouwman, J. Reedijk, J. ter Borg, J. H. Bieleman and A. Schut, New J. Chem., 2003, 27, 854 DOI: 10.1039/B211236A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements