Tungsten disulfide thin films via electrodeposition from a single source precursor

Shibin Thomas; Victoria K. Greenacre; Danielle E. Smith; Yasir J. Noori; Nema M. Abdelazim; Andrew L. Hector; C. H. (Kees) de Groot; William Levason; Philip N. Bartlett; Gillian Reid

doi:10.1039/D1CC03297F

Tungsten disulfide thin films via electrodeposition from a single source precursor†

Shibin Thomas,

*^a Victoria K. Greenacre,*^a Danielle E. Smith,^a Yasir J. Noori,^b Nema M. Abdelazim,^b Andrew L. Hector,

^a C. H. (Kees) de Groot,

^b William Levason,

^a Philip N. Bartlett^a and Gillian Reid

*^a

Author affiliations

* Corresponding authors

^a School of Chemistry, University of Southampton, Southampton SO17 1BJ, UK
E-mail: shibin.thomas@soton.ac.uk, v.k.greenacre@soton.ac.uk, g.reid@soton.ac.uk

^b School of Electronics and Computer Science, University of Southampton, Southampton SO17 1BJ, UK

Abstract

We report a simple process for the electrodeposition of tungsten disulfide thin films from a CH₂Cl₂-based electrolyte using a tailored single source precursor, [NEt₄]₂[WS₂Cl₄]. This new precursor incorporates the 1 : 2 W : S ratio required for formation of WS₂, and eliminates the need for an additional proton source in the electrolyte to remove excess sulfide. The electrochemical behaviour of [NEt₄]₂[WS₂Cl₄] is studied by cyclic voltammetry and electrochemical quartz crystal microbalance techniques, and the WS₂ thin films are grown by potentiostatic electrodeposition.

Chemical Communications

Tungsten disulfide thin films via electrodeposition from a single source precursor†

Abstract

Supplementary files

Article information

Download Citation

Permissions

Tungsten disulfide thin films via electrodeposition from a single source precursor

Social activity

Search articles by author

Spotlight

Advertisements