Electrodeposition of tin nanowires from a dichloromethane based electrolyte

Andrew W. Lodge; Mahboba M. Hasan; Philip N. Bartlett; Richard Beanland; Andrew L. Hector; Reza J. Kashtiban; William Levason; Gillian Reid; Jeremy Sloan; David C. Smith; Wenjian Zhang

doi:10.1039/C8RA03183E

Electrodeposition of tin nanowires from a dichloromethane based electrolyte†

Andrew W. Lodge,^a Mahboba M. Hasan,^a Philip N. Bartlett,

^a Richard Beanland,^b Andrew L. Hector,

*^a Reza J. Kashtiban,^b William Levason,

^a Gillian Reid,

^a Jeremy Sloan,^b David C. Smith^c and Wenjian Zhang^a

Author affiliations

* Corresponding authors

^a Chemistry, University of Southampton, Highfield, Southampton, UK
E-mail: A.L.Hector@soton.ac.uk

^b Department of Physics, University of Warwick, Coventry, UK

^c Physics and Astronomy, University of Southampton, Highfield, Southampton, UK

Abstract

Tin was electrodeposited from a dichloromethane-based electrolyte at ambient temperature into gold coated anodic alumina membranes with nanoscale pores. The tin nanowires are mainly 〈200〉 aligned, together with some 〈101〉 and 〈301〉 wires. Partial filling of the structure and a distribution of wire lengths was found. Grafting of the pores with hydrophobic surface groups was trialled as a means of modifying the deposition, however, it did not increase the proportion of pores in which wires grew. Under potentiostatic conditions the limited rates of nucleation and diffusion down the 1D pores control the growth of the nanowires.

RSC Advances

Electrodeposition of tin nanowires from a dichloromethane based electrolyte†

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Electrodeposition of tin nanowires from a dichloromethane based electrolyte

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