Issue 16, 2016

Maximizing the thermoelectric performance of topological insulator Bi2Te3 films in the few-quintuple layer regime

Abstract

Using first-principles calculations and the Boltzmann theory, we explore the feasibility to maximize the thermoelectric figure of merit (ZT) of topological insulator Bi2Te3 films in the few-quintuple layer regime. We discover that the delicate competitions between the surface and bulk contributions, coupled with the overall quantum size effects, lead to a novel and generic non-monotonous dependence of ZT on the film thickness. In particular, when the system crosses into the topologically non-trivial regime upon increasing the film thickness, the much longer surface relaxation time associated with the robust nature of the topological surface states results in a maximal ZT value, which can be further optimized to ∼2.0 under physically realistic conditions. We also reveal the appealing potential of bridging the long-standing ZT asymmetry of p- and n-type Bi2Te3 systems.

Graphical abstract: Maximizing the thermoelectric performance of topological insulator Bi2Te3 films in the few-quintuple layer regime

Supplementary files

Article information

Article type
Paper
Submitted
27 Jan 2016
Accepted
22 Mar 2016
First published
25 Mar 2016

Nanoscale, 2016,8, 8855-8862

Maximizing the thermoelectric performance of topological insulator Bi2Te3 films in the few-quintuple layer regime

J. Liang, L. Cheng, J. Zhang, H. Liu and Z. Zhang, Nanoscale, 2016, 8, 8855 DOI: 10.1039/C6NR00724D

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