Issue 1, 2003
From the journal:

Journal of Materials Chemistry

‘Latent’ ultraviolet light absorbers

Christoph Kocher,*a   Christoph Wederb  and  Paul Smitha  

* Corresponding authors

a Department of Materials, Eidgenössische Technische Hochschule (ETH) Zürich, Universitätsstrasse 41, UNO C14, CH-8092 Zürich, Switzerland
E-mail: ckocher@ifp.mat.ethz.ch

b Department of Macromolecular Science and Engineering, Case Western Reserve University, 2100 Adelbert Road, Cleveland, USA

Abstract

We have synthesized and characterized photo-labile and acid-labile esters of 2-hydroxybenzophenone and 2-hydroxybenzotriazoles, which, upon appropriate treatment, release classical UV absorbers. Two concepts of ‘latent’ UV absorbers are presented, namely, benzoyl-caged species which release their parent UV absorber upon short-wavelength UV irradiation, and acid-labile species caged with the tert-butoxycarbonyl group which were employed in combination with a photoacid generator. The latent UV absorbers were melt processed into thermoplastic polymers such as linear low density polyethylene and absorbing–non-absorbing patterns were produced in the polymer blend films by spatially resolved conversion, illustrating their usefulness for optical data storage applications.

Graphical abstract: ‘Latent’ ultraviolet light absorbers

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Article information

DOI
https://doi.org/10.1039/B209394D
Article type
Paper
Submitted
01 Oct 2002
Accepted
29 Oct 2002
First published
15 Nov 2002

J. Mater. Chem., 2003,13, 9-15

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‘Latent’ ultraviolet light absorbers

C. Kocher, C. Weder and P. Smith, J. Mater. Chem., 2003, 13, 9 DOI: 10.1039/B209394D

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