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Electron-beam lithography

Going green with silk

Nature Nanotechnology volume 9, pages 251–252 (2014)Cite this article

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Silk fibroin can be used as a photoresist in water-based electron-beam lithographic processing.

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Figure 1: Electron-beam lithography with silk protein as a resist.

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  1. Alex Robinson is at the School of Chemical Engineering, University of Birmingham, Edgbaston, Birmingham B15 2TT, UK,

    Alex Robinson

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  1. Alex Robinson
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Correspondence to Alex Robinson.

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Robinson, A. Going green with silk. Nature Nanotech 9, 251–252 (2014). https://doi.org/10.1038/nnano.2014.70

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