Abstract
We present the results of a chemical etching stability study carried out on ZnO thin films doped with several elements deposited by spray pyrolysis. Prior to the etching, a structural study was done by X-ray diffraction and the texture of the samples was obtained by scanning electron microscopy. The samples were etched employing a solution of dilute hydrochloric acid. The etching rates obtained for the different samples depend on the dopant element and our results confirm that films doped with Cr present the highest stability against chemical etching.
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Olvera, M.d.l.L., Maldonado, A., Asomoza, R. et al. Chemical stability of doped ZnO thin films. Journal of Materials Science: Materials in Electronics 11, 1–5 (2000). https://doi.org/10.1023/A:1008973800554
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DOI: https://doi.org/10.1023/A:1008973800554