Effect of thermal annealing on the phase evolution of silver tungstate in Ag/WO3 films

https://doi.org/10.1016/j.saa.2015.01.125Get rights and content

Highlights

  • Ag2WO3 is prepared in a facile way by annealing multi-layers of Ag and WO3 films.

  • The variation of phase fraction of Ag and Ag2WO3 is studied with temperature.

  • The optimum temperature for the formation of silver tungstate is obtained as 400 °C.

  • The photoluminescence spectra show an emission peak at a wavelength of 441 nm.

Abstract

Silver/tungsten oxide multi-layer films are deposited over quartz substrates by RF magnetron sputtering technique and the films are annealed at temperatures 200, 400 and 600 °C. The effect of thermal annealing on the phase evolution of silver tungstate phase in Ag/WO3 films is studied extensively using techniques like X-ray diffraction, micro-Raman analysis, atomic force microscopy and photoluminescence studies. The XRD pattern of the as-deposited film shows only the peaks of cubic phase of silver. The film annealed at 200 °C shows the presence of XRD peaks corresponding to orthorhombic phase of Ag2WO4 and peaks corresponding to cubic phase of silver with reduced intensity. It is found that, as annealing temperature increases, the volume fraction of Ag decreases and that of Ag2WO4 phase increases and becomes highest at a temperature of 400 °C. When the temperature increases beyond 400 °C, the volume fraction of Ag2WO4 decreases, due to its decomposition into silver and oxygen deficient phase Ag2W4O13. The micro-Raman spectra of the annealed films show the characteristic bands of tungstate phase which is in agreement with XRD analysis. The surface morphology of the films studied by atomic force microscopy reveals that the particle size and r.m.s roughness are highest for the sample annealed at 400 °C. In the photoluminescence study, the films with silver tungstate phase show an emission peak in blue region centered around the wavelength 441 nm (excitation wavelength 256 nm).

Introduction

The distinct properties of semiconductor materials give rise to promising applications in solar cells [1], light-emitting diodes [2], smart windows [3], gas sensing [4] and other optical applications [5]. Metal tungstates are important semiconductors which have been studied for many years because of their potential applications in photoluminescence [6], catalysis [7], optics [8], humidity sensors [9], [10], dosimetry [11], magnetic applications [12], etc. Of several metal tungstates, silver based materials exhibit high photo-catalytic properties under visible light for the degradation of methyl orange dye and Escherichia coli bacteria destruction [13], [14]. Hu et al. [13] obtained irregular particles of Ag2WO4 powders by microwave assisted synthesis at different pHs with photo-catalytic activity for the degradation of different organic dyes under ultraviolet and visible light. Wang et al. [14] prepared Ag2WO4 powders with good antimicrobial action by the supersonic assisted homogeneous precipitation method. Liu et al. [15] used chemical solution method for the synthesis of Ag2WO4/AgCl nanorods for plasmonic photo-catalyst applications. In addition to these applications, Ag2WO4 is getting attraction since it can be used as solid lubricant materials at relatively higher temperatures [16]. Therefore achieving precise control over the synthesis and properties of metal tungstates has been a hot research subject. This paper presents a facile way to prepare Ag2WO4 thin films by thermal annealing multi-layers of Ag and WO3 thin films prepared by RF magnetron sputtering technique and the films thus obtained are characterized using techniques like X-ray diffraction, atomic force microscopy, micro-Raman analysis and photoluminescence spectroscopy. The importance of the present technique is that the multistage sintering of precursor powders and prolonged heat treatment for obtaining metal tungstates used in other methods can be avoided. The effect of thermal annealing in the phase evolution of silver tungstate in Ag/WO3 film is studied extensively.

Section snippets

Experimental details

The silver tungstate thin films are prepared by thermal annealing of multilayer films of silver and tungsten oxide deposited over cleaned quartz substrates at room temperature by RF magnetron sputtering technique. The targets used for sputtering are silver plate (Aldrich 99.99 purity) and pressed tungsten oxide powder (Aldrich 99.99 purity). The sputter chamber is initially evacuated to a pressure of 5.0 × 10−6 mbar, then pure argon gas is admitted into the chamber and the argon pressure is

XRD analysis

Fig. 1 shows the XRD patterns of as-deposited and the annealed Ag/WO3 films coated over quartz substrates. The intense peak obtained at 2θ=38.22° in the XRD pattern of the as-deposited film (AW) corresponds to the lattice reflection plane (1 1 1) of cubic phase of silver (JCPDS card No. 04-0783). The weak peaks obtained at 2θ values 44.42° and 64.5° correspond to the lattice reflection planes (2 0 0) and (2 2 0) of silver. It reveals that the presence of silver in the quartz substrate is not

Conclusion

Silver tungstate thin films are prepared in a facile way by thermal annealing multi-layer films of silver and tungsten oxide deposited over quartz substrates. The XRD pattern of the as-deposited film shows only the peaks of cubic phase of silver whereas the annealed films show the peaks of orthorhombic phase of Ag2WO4 whose intensity is the highest for the film annealed at 400 °C. As the annealing temperature increases, the volume fraction of Ag decreases and that of Ag2WO4 increases and becomes

Acknowledgements

R. Jolly Bose is grateful to University Grants Commission, Government of India for providing financial assistance in the form of faculty improvement programme.

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