The de-oxidation of a ZnTe surface by hydrogen treatment
Introduction
ZnTe attracts attention as it is a candidate for use as the missing green emitter in high-brightness LEDs [1], [2]. We usually grow ZnTe on GaAs or InP substrates by MBE. The lattice mismatch between ZnTe and GaAs is 7.7%, and that between ZnTe and InP is 3.9%. Even if we use InAs as the substrate, the mismatch is 0.76% and this is larger than the mismatch between ZnSe and GaAs. These substrates, however, result in opaque ZnTe-based devices in the visible region. Since ZnSe–ZnTe superlattices have a visible-light up-conversion effect [3] the fabrication of devices using transparent substrates will result in a drastic spread of application fields. The most suitable substrate for ZnTe is a ZnTe single crystal but surface preparation is difficult because the crystal is covered by an oxide layer. To fabricate a device using ZnTe a de-oxidation step is thus needed.
We have successfully cleaned the surface of MBE-ZnSe/GaAs using a convenient method. Samples were exposed only to cracked H2 gas at the growth temperature in the MBE growth chamber [4]. The diffuse RHEED pattern of a ZnSe surface that had been oxidized artificially recovered within a few minutes the streaky pattern that characterized the de-oxidized surface. In this work, we apply this simple method to the ZnTe/GaAs. We expected the same effects for the ZnTe surface.
Section snippets
Experimental procedure
Since we want to demonstrate the de-oxidation method using cracked H2 gas to remove the oxide layer on the surface of ZnTe we again describe the gas source unit [4]. The cracked H2 gas source unit consists of a 0.3 φ tungsten (W) wire located in a ceramic tube and it also contains a gas inlet system. It is settled on a flange fitted to the K-cell port of the MBE growth chamber as shown in Fig. 1. The H2 gas is introduced into the ceramic tube via a gas flow controller and an inlet valve. The
Results and discussion
The treatment parameters were the H2 flow rate, the heater current, the treatment time and the treatment temperature. In our experiments, an increase in the cracking power (heater current) seemed to improve AN surfaces. The surface improvement tends to become saturated at over 6 sccm H2 flow and after 30 min treatment time. For ZnSe, surplus flux and time resulted in surface damage. We observed an obvious de-oxidation of ZnSe in a few minutes under optimal conditions [4]. It is clear that
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Improved growth quality of epitaxial ZnTe thin films on Si (111) wafer with ZnSe buffer layer
2021, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films