Epitaxial growth of SrRuO3 thin films with different orientation by chemical solution deposition
Introduction
As a member of a larger class of interesting ruthenates, perovskite SrRuO3 (SRO) has been fascinatingly investigated more than several decades, due to its surprising itinerant ferromagnetism [1], unusual transport properties, and the degree and consequences of correlation. Beyond its rich physical properties, SRO has a pseudocubic structure with favorable unit cell parameter [2], [3], presents excellent structural compatibility with many perovskite-based oxides, which benefits preparing epitaxial multilayered structures of complex oxides. In addition, epitaxial SRO thin films on appropriate substrates have become the model system of choice for the study of its physical properties, and shows fascinating electrical and magnetic properties with different orientations.
Moreover, high metallic conductivity and temperature stability also make SRO thin film can be used as a bottom electrode and/or buffer layer to grow epitaxial functional thin films in many applications including dynamic and ferroelectric random-access memory [4], [5]. However, for some ferroelectric materials, their comparatively unspectacular ferroelectric properties only display in the films with a particular crystallographic orientation [6]. Thus, the requirements and investigations of SRO thin films grown in different directions on substrates are very important and desirable, not only for the functional films epitaxial growth on the SRO films, but also for recognizing the correlation between the orientation, microstructure and properties.
Additionally, enhanced magnetization has been reported in the epitaxial SRO thin films with different orientations grown on SrTiO3 substrates prepared by pulsed laser deposition method [6]. However, in view of large-area fabrication and expense, low-cost and large-scale technique should be considered. Chemical solution deposition (CSD) method, as an effective route to fabricate multifunctional large-area thin films, possesses many advantages such as low-cost, easy manipulation and so on [7]. Herein, epitaxial SRO thin films on the (100), (110), and (111) LaAlO3 (LAO) single crystal substrates were prepared by CSD method. The epitaxial growth, microstructures, electrical resistivity and magnetic properties of the (100), (110), and (111) SRO thin films were investigated.
Section snippets
Experimental procedure
SRO thin films were respectively prepared on (100), (110), and (111) LAO substrates by CSD method. Ru(NO)(NO3)3 (Ru, w/v = 1.5%) and Sr(CH3COO)2 0.5H2O (99%) were used as raw materials, and 2-methoxyethanol and glacial acetic acid were used as solvents to prepare the SrRuO3 precursor solution. Firstly, Ru(NO)(NO3)3 was dissolved into 2-methoxyethanol and Sr(CH3COO)2. 0.5H2O was dissolved in glacial acetic acid, respectively. Then, the two solutions were mixed and stirred for 6 h to obtain the
Result and discussion
Fig. 1 presents the XRD patterns of all derived SRO thin films. It is seen that all films are phase-pure without any detectable impurity phase such as RuO2, which is usually found in SRO films [4], [8], [9]. In fact, in our early earlier researches, it has been found that the SRO can be derived below 700 °C, while, which shows poor crystallization quality. Over 700 °C, at around 800 °C, the impurity of RuO2 can be observed in the derived SRO thin films. Thus, the annealing temperature of 700 °C
Conclusions
Epitaxial (100), (110), and (111) SRO thin films have been respectively prepared on the (100), (110), and (111) oriented LAO substrates by CSD method. The film SRO (111) exhibits the largest out-of-plane tensile stress. The film SRO (110) displays much denser, homogeneous and well connected grains with the smallest grain size. All the SRO thin films display metallic behavior with low electrical resistivity of 10−4 Ω cm at room-temperature, and then become semiconducting at the temperature below
Acknowledgments
This work was supported by the National NSFC (Nos. 11174288, 11204316 and 11374304), the Joint Funds of the National NSFC and the CAS’ Large-Scale Scientific Facility (Nos. U1432137 and U1232210).
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