Skip to main content
Log in

Hf0.5Zr0.5O2-based ferroelectric memristor with multilevel storage potential and artificial synaptic plasticity

Hf0.5 Zr0.5 O2 基铁电忆阻器的多级存储潜力以及人 工突触可塑性

  • Articles
  • Published:
Science China Materials Aims and scope Submit manuscript

Abstract

Memristors are designed to mimic the brain’s integrated functions of storage and computing, thus breaking through the von Neumann framework. However, the formation and breaking of the conductive filament inside a conventional memristor is unstable, which makes it difficult to realistically mimic the function of a biological synapse. This problem has become a main factor that hinders memristor applications. The ferroelectric memristor overcomes the shortcomings of the traditional memristor because its resistance variation depends on the polarization direction of the ferroelectric thin film. In this work, an Au/Hf0.5Zr0.5O2/p+-Si ferroelectric memristor is proposed, which is capable of achieving resistive switching characteristics. In particular, the proposed device realizes the stable characteristics of multilevel storage, which possesses the potential to be applied to multi-level storage. Through polarization, the resistance of the proposed memristor can be gradually modulated by flipping the ferroelectric domains. Additionally, a plurality of resistance states can be obtained in bidirectional continuous reversibility, which is similar to the changes in synaptic weights. Furthermore, the proposed memristor is able to successfully mimic biological synaptic functions such as long-term depression, long-term potentiation, paired-pulse facilitation, and spike-timing-dependent plasticity. Consequently, it constitutes a promising candidate for a breakthrough in the von Neumann framework.

摘要

忆阻器能够模拟人脑兼具存储和计算的功能, 从而突破 冯·诺依曼框架. 然而, 传统忆阻器内部导电细丝的形成和断裂是不 稳定的, 因此难以真实地模仿生物突触的功能, 这个问题已成为阻 碍忆阻器模拟神经突触应用的主要因素. 铁电忆阻器克服了传统 忆阻器的缺点, 因为它的电阻变化取决于铁电薄膜的极化翻转. 本 工作中, 我们提出了一种具有Au/Hf0.5Zr0.5O2/p+-Si结构的铁电忆阻 器, 能够实现电阻开关特性. 重要的是, 该器件能够实现多级存储的 稳定特性, 具有应用于多级存储的潜力. 同时通过调控铁电极化, 忆 阻器的电阻可由铁电畴的翻转来逐步调节. 同时, 我们可以获取具 有双向连续可逆性的多个电阻状态, 这类似于神经突触权重的变 化. 我们还成功模拟了生物学突触功能, 例如长期抑制, 长期促进, 双脉冲易化和尖峰时间依赖可塑性. 因此, 该器件是一种有希望突 破冯·诺依曼框架的候选者.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Chua L. Memristor-the missing circuit element. IEEE Electr Device L, 1971, 18: 507–519

    Google Scholar 

  2. Strukov DB, Snider GS, Stewart DR, et al. The missing memristor found. Nature, 2008, 453: 80–83

    CAS  Google Scholar 

  3. Chanthbouala A, Garcia V, Cherifi RO, et al. A ferroelectric memristor. Nat Mater, 2012, 11: 860–864

    CAS  Google Scholar 

  4. Kim DJ, Lu H, Ryu S, et al. Ferroelectric tunnel memristor. Nano Lett, 2012, 12: 5697–5702

    CAS  Google Scholar 

  5. Goswami S, Matula AJ, Rath SP, et al. Robust resistive memory devices using solution-processable metal-coordinated azo aromatics. Nat Mater, 2017, 16: 1216–1224

    CAS  Google Scholar 

  6. Sangwan VK, Lee HS, Bergeron H, et al. Multi-terminal memtransistors from polycrystalline monolayer molybdenum disulfide. Nature, 2018, 554: 500–504

    CAS  Google Scholar 

  7. Yi W, Savel’Ev SE, Medeiros-Ribeiro G, et al. Quantized conductance coincides with state instability and excess noise in tantalum oxide memristors. Nat Commun, 2016, 7: 11142

    CAS  Google Scholar 

  8. Yan X, Zhao Q, Chen AP, et al. Vacancy-induced synaptic behavior in 2d WS2 nanosheet-based memristor for low-power neuromorphic computing. Small, 2019, 15: 1901423

    Google Scholar 

  9. Kim KH, Gaba S, Wheeler D, et al. A functional hybrid memristor crossbar-array/CMOS system for data storage and neuromorphic applications. Nano Lett, 2012, 12: 389–395

    CAS  Google Scholar 

  10. Soni R, Petraru A, Meuffels P, et al. Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions. Nat Commun, 2014, 5: 5414

    Google Scholar 

  11. Guo R, Wang Y, Yoong HY, et al. Effect of extrinsically introduced passive interface layer on the performance of ferroelectric tunnel junctions. ACS Appl Mater Interfaces, 2017, 9: 5050–5055

    CAS  Google Scholar 

  12. Yoong HY, Wu H, Zhao J, et al. Epitaxial ferroelectric Hf0.5Zr0.5O2 thin films and their implementations in memristors for brain-inspired computing Adv Funct Mater, 2018, 28: 1806037

    Google Scholar 

  13. Yoon C, Lee JH, Lee S, et al. Synaptic plasticity selectively activated by polarization-dependent energy-efficient ion migration in an ultrathin ferroelectric tunnel junction Nano Lett, 2017, 17: 1949–1955

    CAS  Google Scholar 

  14. Müller J, Böscke TS, Schröder U, et al. Ferroelectricity in simple binary ZrO2 and HfO2. Nano Lett, 2012, 12: 4318–4323

    Google Scholar 

  15. Kim SJ, Mohan J, Summerfelt SR, et al. Ferroelectric Hf0.5Zr0.5O2 thin films: A review of recent advances JOM, 2018, 71: 246–255

    Google Scholar 

  16. Yan X, Zhao J, Liu S, et al. Memristor with Ag-cluster-doped TiO2 films as artificial synapse for neuroinspired computing. Adv Funct Mater, 2018, 28: 1705320

    Google Scholar 

  17. Boyn S, Grollier J, Lecerf G, et al. Learning through ferroelectric domain dynamics in solid-state synapses. Nat Commun, 2017, 8: 14736

    CAS  Google Scholar 

  18. Oh S, Kim T, Kwak M, et al. HfZrOx-based ferroelectric synapse device with 32 levels of conductance states for neuromorphic applications. IEEE Electron Device Lett, 2017, 38: 732–735

    CAS  Google Scholar 

  19. Yan X, Pei Y, Chen H, et al. Self-assembled networked PbS distribution quantum dots for resistive switching and artificial synapse performance boost of memristors. Adv Mater, 2019, 31: 1805284

    Google Scholar 

  20. Yin YW, Burton JD, Kim YM, et al. Enhanced tunnelling electroresistance effect due to a ferroelectrically induced phase transition at a magnetic complex oxide interface. Nat Mater, 2013, 12: 397–402

    CAS  Google Scholar 

  21. Chanthbouala A, Crassous A, Garcia V, et al. Solid-state memories based on ferroelectric tunnel junctions. Nat Nanotech, 2011, 7: 101–104

    Google Scholar 

  22. Wen Z, Li C, Wu D, et al. Ferroelectric-field-effect-enhanced electroresistance in metal/ferroelectric/semiconductor tunnel junctions. Nat Mater, 2013, 12: 617–621

    CAS  Google Scholar 

  23. Luo ZD, Peters JJP, Sanchez AM, et al. Flexible memristors based on single-crystalline ferroelectric tunnel junctions. ACS Appl Mater Interfaces, 2019, 11: 23313–23319

    CAS  Google Scholar 

  24. Wang ZJ, Bai Y Resistive switching behavior in ferroelectric heterostructures. Small, 2019, 15: 1805088

    Google Scholar 

  25. Yan X, Zhou Z, Ding B, et al. Superior resistive switching memory and biological synapse properties based on a simple TiN/SiO2/p-Si tunneling junction structure. J Mater Chem C, 2017, 5: 2259–2267

    CAS  Google Scholar 

  26. Ambriz-Vargas F, Kolhatkar G, Broyer M, et al. A complementary metal oxide semiconductor process-compatible ferroelectric tunnel junction. ACS Appl Mater Interfaces, 2017, 9: 13262–13268

    CAS  Google Scholar 

  27. Pantel D, Alexe M. Electroresistance effects in ferroelectric tunnel barriers. Phys Rev B, 2010, 82: 134105

    Google Scholar 

  28. Pantel D, Goetze S, Hesse D, et al. Room-temperature ferroelectric resistive switching in ultrathin Pb(Zr0.2Ti0.8)O3 films. ACS Nano, 2011, 5: 6032–6038

    CAS  Google Scholar 

  29. Matveyev Y, Egorov K, Markeev A, et al. Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO2/TiN devices. J Appl Phys, 2015, 117: 044901

    Google Scholar 

  30. Hoffmann M, Schroeder U, Schenk T, et al. Stabilizing the ferroelectric phase in doped hafnium oxide. J Appl Phys, 2015, 118: 072006

    Google Scholar 

  31. Li C, Hu M, Li Y, et al. Analogue signal and image processing with large memristor crossbars. Nat Electron, 2017, 1: 52–59

    Google Scholar 

  32. Shosuke F, Yuuichi K, Tsunehiro I, et al. First demonstration and performance improvement of ferroelectric HfO2-based resistive switch with low operation current and intrinsic diode property. In: Proceedings of the IEEE Symposium on VLSI Technology. Honolulu, 2016

  33. Sang X, Grimley ED, Schenk T, et al. On the structural origins of ferroelectricity in HfO2 thin films. Appl Phys Lett, 2015, 106: 162905

    Google Scholar 

  34. Covi E, Brivio S, Fanciulli M, et al. Synaptic potentiation and depression in Al:HfO2-based memristor. MicroElectron Eng, 2015, 147: 41–44

    CAS  Google Scholar 

  35. Guo R, Zhou Y, Wu L, et al. Control of synaptic plasticity learning of ferroelectric tunnel memristor by nanoscale interface engineering. ACS Appl Mater Interfaces, 2018, 10: 12862–12869

    CAS  Google Scholar 

  36. Yang R, Huang HM, Hong QH, et al. Synaptic suppression triplet-STDP learning rule realized in second-order memristors. Adv Funct Mater, 2018, 28: 1704455

    Google Scholar 

  37. Park MH, Kim HJ, Kim YJ, et al. Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes. Appl Phys Lett, 2014, 105: 072902

    Google Scholar 

  38. Jin Hu W, Wang Z, Yu W, et al. Optically controlled electro-resistance and electrically controlled photovoltage in ferroelectric tunnel junctions. Nat Commun, 2016, 7: 10808

    Google Scholar 

  39. Garcia V, Bibes M. Ferroelectric tunnel junctions for information storage and processing. Nat Commun, 2014, 5: 4289

    CAS  Google Scholar 

  40. Li C, Huang L, Li T, et al. Ultrathin BaTiO3-based ferroelectric tunnel junctions through interface engineering. Nano Lett, 2015, 15: 2568–2573

    CAS  Google Scholar 

  41. Fan Z, Xiao J, Wang J, et al. Ferroelectricity and ferroelectric resistive switching in sputtered Hf0.5Zr0.5O2 thin films. Appl Phys Lett, 2016, 108: 232905

    Google Scholar 

  42. Kozodaev MG, Chernikova AG, Korostylev EV, et al. Ferroelectric properties of lightly doped La:HfO2 thin films grown by plasmaassisted atomic layer deposition. Appl Phys Lett, 2017, 111: 132903

    Google Scholar 

  43. Milano G, Luebben M, Ma Z, et al. Self-limited single nanowire systems combining all-in-one memristive and neuromorphic functionalities. Nat Commun, 2018, 9: 5151

    Google Scholar 

  44. Yoon JH, Wang Z, Kim KM, et al. An artificial nociceptor based on a diffusive memristor. Nat Commun, 2018, 9: 417

    Google Scholar 

  45. E. Covi SB, A. Serb, T. Prodromakis, et al. HfO2-based memristors for neuromorphic applications. In: Proceedings of the IEEE International Symposium on Circuits and Systems (ISCAS). Montreal, 2016. 393–396

  46. Mikheev V, Chouprik A, Lebedinskii Y, et al. Ferroelectric second-order memristor. ACS Appl Mater Interfaces, 2019, 11: 32108–32114

    CAS  Google Scholar 

  47. Yan X, Wang K, Zhao J, et al. A new memristor with 2D Ti3C2Tx MXene flakes as an artificial bio-synapse. Small, 2019, 15: 1900107

    Google Scholar 

  48. Wang G, Yan X, Chen J, et al. Memristors based on the hybrid structure of oxide and boron nitride nanosheets combining memristive and neuromorphic functionalities. Phys Status Solidi RRL, 2019, 14: 1900539

    Google Scholar 

  49. Yan X, Zhang L, Chen H, et al. Graphene oxide quantum dots based memristors with progressive conduction tuning for artificial synaptic learning. Adv Funct Mater, 2018, 28: 1803728

    Google Scholar 

  50. Zarubin S, Suvorova E, Spiridonov M, et al. Fully ALD-grown TiN/Hf0.5Zr0.5O2/TiN stacks: Ferroelectric and structural properties. Appl Phys Lett, 2016, 109: 192903

    Google Scholar 

Download references

Acknowledgements

This work was supported by the National Natural Science Foundation of China (61674050 and 61874158), the Outstanding Youth Project of Hebei Province (F2016201220), the Outstanding Youth Cultivation Project of Hebei University (2015JQY01), the Project of Science and Technology Activities for Overseas Researcher (CL 201602), the Project of Distinguished Young of Hebei Province (A2018201231), the Support Program for the Top Young Talents of Hebei Province (70280011807), the Training and Introduction of High-level Innovative Talents of Hebei University (801260201300), the Hundred Persons Plan of Hebei Province (E2018050004 and E2018050003), and the Supporting Plan for 100 Excellent Innovative Talents in Colleges and Universities of Hebei Province (SLRC2019018)

Author information

Authors and Affiliations

Authors

Contributions

Yan X conceived the idea and revised the paper. Yu T fabricated the samples, finished the test data and prepared the manuscript. Chang J and Chen J coordinated this study. This article was discussed with contributions from all authors. All authors have approved the final version of this article.

Corresponding authors

Correspondence to Jingjing Chang  (常晶晶), Jingsheng Chen  (陈景升) or Xiaobing Yan  (闫小兵).

Additional information

Conflict of interest

The authors declare that they have no conflict of interest.

Supplementary information

Experimental details are available in the online version of the paper.

Xiaobing Yan is currently a professor at the College of Electronic Information Engineering, Hebei University. He received his PhD degree from Nanjing University in 2011. From 2014 to 2016, he held the Research Fellow position at the National University of Singapore. His current research interest is in the field of memristors.

Tianqi Yu received a bachelor’s degree from Henan University of Science and Technology in 2018. He is a graduate student at the College of Electronic Information Engineering, Hebei University. His current research focuses on ferroelectric materials for memristor applications.

Electronic Supplementary Material

40843_2020_1444_MOESM1_ESM.pdf

Ferroelectric memristor based on Hf0.5Zr0.5O2 has potential of multi-level storage and characteristic of artificial synaptic plasticity

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Yu, T., He, F., Zhao, J. et al. Hf0.5Zr0.5O2-based ferroelectric memristor with multilevel storage potential and artificial synaptic plasticity. Sci. China Mater. 64, 727–738 (2021). https://doi.org/10.1007/s40843-020-1444-1

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s40843-020-1444-1

Keywords

Navigation