Skip to main content
Log in

Abstract

A micro-needle array was fabricated on a polycarbonate (PC) substrate using an electroformed-Ni mold with a conical concave pattern. The diameter and length of each needle were 50 μm and 135 μm, respectively. The needle array pattern of the electroformed-Ni mold was produced by combining a grayscale mask for X-ray lithography with Ni electroforming technology. The X-ray grayscale mask was composed of Si absorbers and a SU-8 membrane. Each Si absorber had a three-dimensional cone shape rather than a rectangular shape. Threedimensional Si structures were formed to etch an active Si layer in a silicon-on-insulator wafer using a taperedtrench etching technology. Beamline BL-4 in the TERAS synchrotron radiation facility at AIST was used for the Xray lithography experiments. X-rays that penetrated the X-ray grayscale mask irradiated a polymethylmethacrylate (PMMA) sheet. Pt was deposited on the PMMA structure after developing, and Ni was electroformed on it. The electroformed-Ni object was processed by grinding to complete a Ni mold. Finally, the micro-needle array was fabricated by thermal-imprinting on a 0.5-mm thick PC sheet with the electroformed Ni mold.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Henry, S., McAllister, D. V., Allen, M. G. and Prausnits, M. R., “Microfabricated microneedles: A novel approach to transdermal drug delivery,” J. Pharm. Sci., Vol. 87, No. 8, pp. 922–925, 1998.

    Article  Google Scholar 

  2. McAllister, D. V., Wang, P. M., Davis, S. P., Park, J. H., Canatella, P. J., Allen, M. G. and Prausnitz, M. R., “Microfabricated needles for transdermal delivery of macromolecules and nanoparticles: fabrication methods and transport studies,” Proc. Nat. Acad. Sci. (USA), Vol. 100, No. 24, pp. 13755–13760, 2003.

    Article  Google Scholar 

  3. Becker, E. W., Ehrfeld, W., Hagmann, P., Maner, A. and Münchmeyer, D., “Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process),” Microelectron Eng., Vol. 4, No. 1, pp. 35–42, 1986.

    Article  Google Scholar 

  4. Nakamura, Y., Uemura, S., Okajima, K. and Tabata, O., “Moving Mask Direct Photo-Etching (M2DPE) for 3-D Micromachining of Polytetrafluoroethylene,” Books of Abstracts Fifth Biennial Workshop of High Aspect Ratio Micro-Structure Technology (HARMST2003), pp. 19–20, 2003.

  5. Lee, K. and Lee, S. S., “Deep X-ray Lithography using Mask with Integrated Electrostatic and Electrothermal Actuators,” Books of Abstracts Fifth Biennial Workshop of High Aspect Ratio Micro-Structure Technology (HARMST2003), pp. 45–46, 2003.

  6. Horade, M., Khumpuang, S., Fujioka, K. and Sugiyama, S., “Mask design compensation for sloped sidewall structures fabricated by X-ray lithography,” Microsyst. Technol., Vol. 13, No. 3–4, pp. 215–219, 2007.

    Google Scholar 

  7. Khumpuang, S., Horade, M., Fujioka, K. and Sugiyama, S., “Geometrical strengthening and tip-sharpening of a microneedle array fabricated by X-ray lithography,” Microsyst. Technol., Vol. 13, No. 3–4, pp. 209–214, 2007.

    Google Scholar 

  8. Gelorme, J. D., Cox, R. J. and Gutierrez, S. A. R., “Photoresist co mposition and printed circuit boards and packages made therewit h,” US Patent No. 4882245, 1989.

  9. Mekaru, H., Takano, T., Awazu, K., Takahashi, M. and Maeda, R., “Fabrication of a needle array using a Si grayscale mask for x-ray lithography,” J. Vac. Sci. Technol. B, Vol. 25, No. 6, pp. 2196–2201, 2007.

    Article  Google Scholar 

  10. Mekaru, H., Takano, T., Awazu, K., Takahashi, M. and Maeda, R., “Fabrication and evaluation of a grayscale mask for x-ray lithography using MEMS technology,” J. Micro/Nanolith. MEMS MOEMS, Vol. 7, No. 1, pp. 013009-1-013009-9, 2008.

  11. Puech, M., Andrieu, B., Poin, L., Launay, N., Arnal, N., Godinat, P. and Gruffat, J. M., Technical paper of Alcatel Vacuum Technology, “FABRICATION of 3D PACKAGING TSV USING DRIE,” http://www.adixen.com/adixen_avt/download/docs/news/doc176.pdf, 2004.

  12. Awazu, K., Wang, X., Fujimaki, M., Kuriyama, T., Sai, A., Ohki, Y. and Imai, H., “Fabrication of two- and three-dimensional photonic crystals of titania with submicrometer resolution by deep x-ray lithography,” J. Vac. Sci. Technol. B, Vol. 23, No. 3, pp. 934–939, 2005.

    Article  Google Scholar 

  13. Goko, S., Toyokawa, H., Koike, M., Watanabe, K., Zama, T., Ikeura, H., Saito, N., Morishita, Y., Awazu, K., Uritani, A., Suzuki, I., Saito, T., Ohkubo, M., Mikado, T. and Yamada, K., “Present Status of AIST Electron Storage Ring TERAS,” Proc. the 1st Annual Meeting of Particle Accelerator Society of Japan and the 29th Linear Accelerator Meeting, pp. 203–205, 2004.

  14. Chou, S. Y., Krauss, P. R. and Renstrom, P. J., “Imprint of sub-25 nm vias and trenches in polymers,” Appl. Phys. Lett, Vol. 67, No. 21, pp. 3114–3116, 1995.

    Article  Google Scholar 

  15. Motoji, T., “Technological trends of fluorine release agents for pr ecise molds,” The Tribology, Vol. 249, pp. 54–56, 2008.

    Google Scholar 

  16. Takahashi, M., Goto, H., Maeda, R. and Maruyama, O., “Desktop Nanoimprint Systm -Protptype and Performance-,” Proc. Jpn. Soc. Precision Engineering Conf., pp. 737–738, 2006.

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Harutaka Mekaru.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Mekaru, H., Takahashi, M. Imprinting a needle array on a polycarbonate substrate. Int. J. Precis. Eng. Manuf. 10, 79–83 (2009). https://doi.org/10.1007/s12541-009-0012-5

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s12541-009-0012-5

Keywords

Navigation