Abstract
The metal-like behaviors and metal–semiconductor transition (MST) of highly conducting Zn1−x Al x O (x = 1 at.% to 10 at.%) thin films deposited by cosputtering on a-Al2O3 have been investigated. The temperature-dependent transport properties reveal that the Zn1−x Al x O films were highly degenerate. The MST temperature (T MST) varied from 190 K to 260 K with Al doping from x = 2 at.% to 10 at.%. A simple degenerate band model is used to explain the observed shift in the metal-like behaviors upon Al doping. An empirical approach is used to analyze the resistivity functional below TMST, taking into account the contributions from both the weak localization and Coulomb interactions in explaining the MST. Analysis by least-square fittings of measured data shows excellent agreement. The optical bandgap increases with carrier concentration as n 2/3Hall , which is interpreted as the Burstein–Moss shift for a nonparabolic effective mass. Such nonparabolicity is scrutinized by quantitative comparisons of the plasma edge values n optical versus the n Hall values.
Similar content being viewed by others
References
Ü. ÖzgÜr, Y.I. Alivov, C. Liu, A. Teke, M.A. Reshchikov, S. Doğan, V. Avrutin, S.-J. Cho, and H. Morkoç, J. Appl. Phys. 98, 41301 (2005).
D.S. Ginley and C. Bright, MRS Bull. 25, 15 (2000).
B.G. Lewis and D.C. Paine, MRS Bull. 25, 22 (2000).
E. Fortunato, P. Barquinha, A. Pimentel, A. Gonçalves, A. Marques, L. Pereira, and R. Martins, Thin Solid Films 487, 205 (2005).
A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S.F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Koinuma, and M. Kawasaki, Nat. Mater. 4, 42 (2005).
T. Minami, MRS Bull. 25, 38 (2000).
T. Minami, Semicond. Sci. Technol. 20, S35 (2005).
K. Matsubara, P. Fons, K. Iwata, A. Yamada, K. Sakurai, H. Tampo, and S. Niki, Thin Solid Films 431–432, 369 (2003).
O. Jani, I. Ferguson, C. Honsberg, and S. Kurtz, Appl. Phys. Lett. 91, 132117 (2007).
L.-M. Wang, C.-Y. Wang, C.-R. Jheng, S.-J. Wu, C.-K. Sai, Y.-J. Lee, C.-Y. Chiang, and B.-Y. Shew, Appl. Phys. A 122, 731 (2016).
H. Agura, A. Suzuki, T. Matsushita, T. Aoki, and M. Okuda, Thin Solid Films 445, 263 (2003).
O. Bamiduro, H. Mustafa, R. Mundle, R.B. Konda, and A.K. Pradhan, Appl. Phys. Lett. 90, 252108 (2007).
V. Bhosle, A. Tiwari, and J. Narayan, Appl. Phys. Lett. 88, 32106 (2006).
N.W. Schmidt, T.S. Totushek, W.A. Kimes, D.R. Callender, and J.R. Doyle, J. Appl. Phys. 94, 5514 (2003).
K.C. Park, D.Y. Ma, and K.H. Kim, Thin Solid Films 305, 201 (1997).
J.F. Chang and M.H. Hon, Thin Solid Films 386, 79 (2001).
T. Tsuji and M. Hirohashi, Appl. Surf. Sci. 157, 47 (2000).
D. Horwat and A. Billard, Thin Solid Films 515, 5444 (2007).
K. Ellmer, J. Phys. D Appl. Phys. 33, R17 (2000).
J. Narayan and B.C. Larson, J. Appl. Phys. 93, 278 (2003).
S.N. Bai and T.Y. Tseng, Thin Solid Films 515, 872 (2006).
M. Chen, X. Wang, Y.H. Yu, Z.L. Pei, X.D. Bai, C. Sun, R.F. Huang, and L.S. Wen, Appl. Surf. Sci. 158, 134 (2000).
H. Hartnagel, Semiconducting Transparent Thin Films (Institute of Physics Pub., Bristol [England]; Philadelphia, PA, 1995).
J. Singleton, Band Theory and Electronic Properties of Solids (Oxford: Oxford Press, 2001).
C. Kittel, Introduction to Solid State Physics, 8th ed. (Hoboken: John Wiley & Sons, 2005).
W.N. Lawless and T.K. Gupta, J. Appl. Phys. 60, 607 (1986).
R.A. Robie, H.T. Haselton, and B.S. Hemingway, J. Chem. Thermodyn. 21, 743 (1989).
Y. Furubayashi, T. Hitosugi, Y. Yamamoto, K. Inaba, G. Kinoda, Y. Hirose, T. Shimada, and T. Hasegawa, Appl. Phys. Lett. 86, 252101 (2005).
T.F. Rosenbaum, K. Andres, G.A. Thomas, and R.N. Bhatt, Phys. Rev. Lett. 45, 1723 (1980).
A.L. Efros and M. Pollak, eds., Electron-electron Interactions in Disordered Systems (Amsterdam: North-Holland, 1985).
P.A. Lee and T.V. Ramakrishnan, Rev. Mod. Phys. 57, 287 (1985).
J.I. Pankove and D.A. Kiewit, J. Electrochem. Soc. 119, 156C (1972).
T.J. Coutts, D.L. Young, and X. Li, MRS Bull. 25, 58 (2000).
B.E. Sernelius, K.-F. Berggren, Z.-C. Jin, I. Hamberg, and C.G. Granqvist, Phys. Rev. B 37, 10244 (1988).
T. Pisarkiewicz, K. Zakrzewska, and E. Leja, Thin Solid Films 174, 217 (1989).
D. Mergel and Z. Qiao, J. Phys. D Appl. Phys. 35, 794 (2002).
Z. Qiao, C. Agashe, and D. Mergel, Thin Solid Films 496, 520 (2006).
M. Theiss, SCOUT (2016). http://www.mtheiss.com/?c=1&content=scout. Accessed 10 Oct 2016.
S. Brehme, F. Fenske, W. Fuhs, E. Nebauer, M. Poschenrieder, B. Selle, and I. Sieber, Thin Solid Films 342, 167 (1999).
F. Ruske, A. Pflug, V. Sittinger, B. Szyszka, D. Greiner, and B. Rech, Thin Solid Films 518, 1289 (2009).
A.V. Singh, R.M. Mehra, A. Yoshida, and A. Wakahara, J. Appl. Phys. 95, 3640 (2004).
K. Ellmer, J. Phys. D Appl. Phys. 34, 3097 (2001).
O. Lozano, Q.Y. Chen, P.V. Wadekar, H.W. Seo, P.V. Chinta, L.H. Chu, L.W. Tu, I. Lo, S.W. Yeh, N.J. Ho, F.C. Chuang, D.J. Jang, D. Wijesundera, and W.-K. Chu, Sol. Mat. Sol. Cells 113, 171 (2013).
Acknowledgements
This study was supported by the Ministry of Science and Technology (MOST), Taiwan, ROC, under Grant Nos. 103-2112-M-110-003, 104-2221-E-110-063, and 105-2221-E-110-042 for P.V.W., O.L., and L.W.T., O.L. is now with Tecnológico de Monterrey, Mexico. Partial support by the State of Texas through the Texas Centre for Superconductivity at University of Houston is also acknowledged.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Chinta, P.V., Lozano, O., Wadekar, P.V. et al. Evolution of Metallic Conductivity in Epitaxial ZnO Thin Films on Systematic Al Doping. J. Electron. Mater. 46, 2030–2039 (2017). https://doi.org/10.1007/s11664-016-5117-x
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11664-016-5117-x