Abstract
Nd3+/Zr4+-cosubstituted bismuth titanate (BNTZ x , x = 0, 0.05, 0.1, 0.3, and 0.5) thin films have been fabricated by chemical solution deposition and their polarization hysteresis loops, leakage current, and capacitance butterfly loops investigated. Results show that, at Zr content of x = 0.1, both capacitance and remanent polarization can be greatly improved. The BNTZ0.1 film also exhibits fatigue-free, excellent leakage current characteristics (I ≈ 9.44 × 10−9 A) at applied voltage of 3 V. High-quality c-axis-oriented BNTZ x = 0.1 films with improved electrical properties were fabricated; this finding supports the feasibility of engineering polarization rotation in ferroelectric bismuth titanate (as suggested theoretically by Roy et al. in Appl. Phys. Lett. 102:182901, 2013).
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Acknowledgements
The work was supported by funding from the National Natural Science Foundation of China (Nos. 11104116, 51372100 and 51472210), the Outstanding Young Scientists Foundation Grant of Shandong Province (No. BS2011CL003), 973 Program (Grant No. 2012CB326404), and the Doctoral Foundation of University of Jinan, China (No. 161220).
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Yang, F., Guo, Y., Zong, Z. et al. Improving the Electrical Properties of Zr-Doped Bi3.15Nd0.85Ti3O12 Thin Films by Engineering Polarization Rotation. J. Electron. Mater. 45, 3540–3545 (2016). https://doi.org/10.1007/s11664-016-4508-3
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DOI: https://doi.org/10.1007/s11664-016-4508-3