Abstract
In order to comprehensively investigate the discharge characteristics of an atmospheric-pressure radio-frequency (RF) pulsed discharge in Ar/CH4/CO2, a phase-resolved measurement is given in this paper. Firstly, the discharge characteristics of RF plasma in a gas mixture of Ar, CO2 and CH4 are investigated under different parameters. It is found peak power is more efficient than duty cycle in increasing the discharge area. Besides, a phase-resolved morphology of RF plasma is given. The discharge in the positive cycle is longer in length and stronger in emission intensity than in the negative cycle. Secondly, different activation paths of species have been obtained by using phase-resolved optical emission spectroscopy. Ar species is mainly activated by electron collision effect, while CH and C2 are mainly activated by Ar metastable species. Finally, detailed electron kinetics is analyzed. The results show that most energy is transferred to the vibrational excitation compared to elastic activation, electronic excitation, and ionization under different ratios of CO2 and CH4 to Ar. Besides, under a higher ratio of CH4 and CO2 to Ar, the generating rate of species and power loss rate are higher. It proves that higher fraction of CO2 and CH4 is better for the conversion rate and energy efficiency under RF discharge in theory, which guides the reforming of CH4 and CO2 in RF discharge.
Similar content being viewed by others
References
Markewitz P, Kuckshinrichs W, Leitner W, Linssen J, Zapp P, Bongartz R, Schreiber A, Müller TE (2012) Energy Environ Sci 5:7281–7305
Wang XL, Gao Y, Zhang S, Sun H, Li J, Shao T (2019) Appl Energy 243:132–144
Tu X, Gallon HJ, Twigg MV, Gorry PA, Whitehead JC (2011) J Phys D Appl Phys 44:274007
Nielsen JR, Dibkjaer I, Christiansen LJ (1992) Chemical reactor technology for environmentally safe reactors and products. NATO ASI, NATO
Shao T, Wang RX, Zhang C, Yan P (2018) High Volt 3:14
Aziznia A, Bozorgzadeh HR, Seyed-Matin N, Baghalha M, Mohamadalizadeh A (2012) J Nat Gas Chem 21:466–475
Yao SL, Okumoto M, Nakayama A, Suzuki E (2001) Energy Fuels 15:1295–1299
Okkan A, Dufour T, Arnoult G, De Keyzer P, Bogaerts A, Reniers F (2015) J CO2 Util 9:78–81
Zhang X, Cha MS (2013) J Phys D Appl Phys 46:415205
Zhu B, Li X, Liu J, Zhu A (2012) Int J Hydrogen Energy 37:16916–16924
Scapinello M, Martini LM, Dilecce G, Tosi P (2016) J Phys D Appl Phys 49:75602
Zhu F, Zhang H, Han X, Yan J, Ni M, Li X, Tu X (2017) Fuel 199:430–437
Xia Y, Lu N, Wang B, Li J, Shang K, Jiang N, Wu Y (2017) Int J Hydrogen Energy 42:22776–22785
Savinov SY, Lee H, Song HK, Na B-K (1999) Ind Eng Chem Res 38:2540–2547
Zhang K, Zhang S, Gao Y, Sun H, Yan P, Shao T (2019) Proc Chin Soc Electr Eng 39:3280–3289
Park J, Henins I, Herrmann HW, Selwyn GS (2001) J Appl Phys 89:15–19
Yang XW, Moravej M, Nowling GR, Chang JP, Hicks RF (2005) IEEE Trans Plasma Sci 33:294–295
Capezzuto P, Cramarossa F, d’Agostino R, Molinari E (1977) Rev Phys Appl 12:1205–1208
Yao SL, Ouyang F, Nakayama A, Suzuki E, Okumoto M, Mizuno A (2000) Energy Fuels 14:910–914
Okumoto M, Kim HH, Takashima K, Katsura S, Mizuno A (2001) IEEE Trans Ind Appl 37:1618–1624
Luo LX, Wu WD, Sun WG, Tang YJ, Zhu YH (2007) Chin J Vac Sci Technol 27:203–207
Yuan QH, Ren P, Zhou YJ, Yin GQ, Dong CZ (2019) Plasma Sci Technol 21:025402
Iza F, Lee JK, Kong MG (2007) Phys Rev Lett 99:075004
Levaton J, Klein AN, Binder C (2018) Plasma Chem Plasma Process 38:1259–1272
Park J, Henins I, Herrmann HW, Selwyn GS, Hicks RF (2001) J Appl Phys 89:20–28
Kraus M, Egli W, Haffner K, Eliasson B, Kogelschatz U, Wokaun A (2002) Phys Chem Chem Phys 4:668–675
Wu AJ, Yan JH, Zhang H, Zhang M, Du CM, Li XD (2014) Int J Hydrogen Energy 39:17656–17670
Wang Q, Yan BH, Jin Y, Cheng Y (2009) Plasma Chem Plasma Process 29:217–228
Li SZ, Wu Q, Wang DZ, Uhm HS (2011) Phys Lett A 375:598–600
Moravej M, Yang X, Hicks RF (2006) J Appl Phys 99:093305
Pinhão NR, Janeco A, Branco JB (2011) Plasma Chem Plasma Process 31:427–439
O’Connell D, Gans T, Vender D, Czarnetzki U, Boswell R (2007) Phys Plasmas 14:034505
Vender D, Boswell RW (1992) J Vac Sci Technol A 10:1331–1338
Wu SQ, Liu XY, Mao WH, Chen W, Liu C, Zhang CH (2018) J Appl Phys 124:243302
Sigeneger F, Schäfer J, Foest R, Loffhagen D (2019) Plasma Sources Sci Technol 28:055004
Schulze J, Ganz T, O’Connell D, Czarnetzki U, Ellingboe AR, Turner MM (2007) J Phys D Appl Phys 40:7008–7018
Gibson AR, Donkό Z, Alelyani L, Bischoff L, Hübner G, Bredin J, Doyle S, Korolov I, Niemi K, Mussenbrock T (2019) Plasma Sources Sci Technol 28:01LT01
Bleekrode R, Nieuwpoort WC (1965) J Chem Phys 43:3680–3687
Parigger C, Plemmons DH, Hornkohl JO, Lewis JWL (1994) J Quant Spectrosc Radiat Transf 52:707–711
Kim DB, Jung H, Gweon B, Moon SY, Rhee JK, Choe W (2011) Phys Plasmas 18:043503
Garofano V, Montpetit F, Glad X, Gangwar RK, Stafford L (2019) J Vac Sci Technol A 37:021301
Crintea DL, Luggenhölscher D, Kadetov VA, Isenberg Ch, Czarnetzki U (2008) J Phys D Appl Phys 41:082003
Floettmann K (2015) Phys Rev Accel Beams 18:064801
Kolts JH, Setser DW (1978) J Chem Phys 68:4848–4859
Velazco JE, Kolts JH, Setser DW (1978) J Chem Phys 69:4357–4373
Bogaerts A, Berthelot A, Heijkers S, Kolev S, Snoeckx R, Sun S, Trenchev G, Laer KV, Wang W (2017) Plasma Sources Sci Technol 26:063001
Nguyen T, Hernandez E, Donnelly VM, Economou DJ (2018) J Vac Sci Technol A 36:04F406
Stanfield SA, Menart J (2009) AIAA J 47:1107–1115
Luque J, Crosley DR (1999) Lifbase, database, spectral simulation for OH A-X, OD A-X, NO A-X, B-X D-X CH A-X, B-X, C-X CN B-X, SiH A-X, CF A-X (Version 1.5). SRI International, Menlo Park
Hagelaar GJM, Pitchford LC (2005) Plasma Sources Sci Technol 14:722–733
Yamabe B (1983) Phelps. Phys Rev 27:1345–1352
PHELPS database (2013) https://www.lxcat.net. Accessed 4 June 2018
Janeco A, Pinhão NR, Guerra V (2015) J Phys Chem C 119:109–120
Shao T, Long KH, Zhang C, Yan P, Zhang SC, Pan RZ (2008) J Phys D Appl Phys 46:215203
Cascella M, Curik R, Gianturco FA (2001) J Phys B At Mol Opt 34:705–723
Pietanza LD, Colonna G, D’Ammando G, Laricchiuta A, Capetelli M (2016) Chem Phys 468:44–52
Lieberman MA, Lichtenberg AJ (2015) Principles of plasma discharges and materials processing. Wiley, Hoboken
Zhang DY, Huang Q, Devid EJ, Schuler E, Shiju NR, Rothenberg G, Rooij GV, Yang RL, Liu KZ, Kleyn AW (2018) J Phys Chem C 122:19338–19347
Acknowledgements
This work was financially supported by National Natural Science Foundation of China (Nos. 51637010 and 51807190), DNL Cooperation Fund, CAS (DNL180204), and the Royal Society – Newton Advanced Fellowship, UK (Grant Number NA140303).
Author information
Authors and Affiliations
Corresponding authors
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
About this article
Cite this article
Liu, Z., Huang, B., Zhu, W. et al. Phase-Resolved Measurement of Atmospheric-Pressure Radio-Frequency Pulsed Discharges in Ar/CH4/CO2 Mixture. Plasma Chem Plasma Process 40, 937–953 (2020). https://doi.org/10.1007/s11090-020-10071-5
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11090-020-10071-5