Abstract
An investigation is performed into the microstructural, electronic and optical properties of Mo:ZnO (MZO) thin films deposited on glass substrates using radio frequency magnetron sputtering with various gas flow rates and deposition times. The XRD results show that all of the deposited films exhibit a strong (002) preferential orientation. The average transmittance of the MZO thin films is around 80 % in the visible light range. In addition, the resistivity and Hall mobility have values of 4.5 × 10−3 Ω-cm and 25 cm2/V s, respectively, given argon flow rate of 15 sccm, a deposition time of 40 min and a sputtering power of 100 W.
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The authors gratefully acknowledge the financial support provided to this study by the National Science Council (NSC) of Taiwan under Contract No. NSC 102-2212-E-151-006-MY3.
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This article is part of the Topical Collection on Micro/Nano Photonics for the International Year of Light 2015, Guest Edited by Yen-Hsun Su, Lei Liu, Xinlong Xu and Zhenhua Ni.
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Chen, TH., Jian, BL. Optical and electronic properties of Mo:ZnO thin films deposited using RF magnetron sputtering with different process parameters. Opt Quant Electron 48, 77 (2016). https://doi.org/10.1007/s11082-015-0357-1
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DOI: https://doi.org/10.1007/s11082-015-0357-1