Abstract
Silica based ammonium molybdophosphate (AMP/SiO2) adsorbent was used to remove Cs(I) from HNO3 solution. The adsorbent with different absorbed dose (0–300 kGy) was characteristed by X-ray power diffraction. The adsorption data against different γ-ray absorbed doses were analyzed by the Langmuir isotherm. The adsorption capacity decreased slightly from 23.22 to 22.37 mg/g with the increase of the absorbed dose. The breakthrough properties of Cs(I) were conducted using column packed with AMP/SiO2 before and after irradiation. The chemical stability of AMP/SiO2 at 300 kGy absorbed dose in 3 mol/L (M) HNO3 was excellent.
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This work was supported by the National Natural Science Foundation of China (11405106) and the Scientific Research Foundation for the Returned Overseas Chinese Scholars, State Education Ministry.
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Zhang, X., Wu, Y., Chen, B. et al. The effect of γ-ray irradiation on the adsorption properties and chemical stability of AMP/SiO2 towards Cs(I) in HNO3 solution. J Radioanal Nucl Chem 310, 905–910 (2016). https://doi.org/10.1007/s10967-016-4862-x
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DOI: https://doi.org/10.1007/s10967-016-4862-x