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Study of Dense Nitrogen Plasma Irradiation of Aluminum Targets by APF Plasma Focus Device

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Abstract

The nitridation of Al surfaces is obtained by irradiating nitrogen ions from APF device. The Vickers Micro-Hardness values are improved approximately three times for the nitrided samples comparing to the non-nitrided ones. The X-ray diffraction analysis is carried out in order to explore the phase changes in the near surface structure of the metals. The Nuclear Reaction Analysis shows the depth of the nitride composed on the metal surfaces clearly and quantitatively. The results of Scanning Electron Microscopy indicate changes in surface morphology which are the emergence of a smooth and uniform film scattered on the surface of the nitrided specimens.

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Acknowledgments

This work was supported by Amirkabir University of Technology, Van de Graaff and XRD laboratory of AEOI, SEM laboratory of Tehran University, and Metallographic Laboratory of Amirkabir University.

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Authors and Affiliations

  1. Amirkabir University of Technology, Tehran, Iran

    Mohammad Afrashteh & Morteza Habibi

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  1. Mohammad Afrashteh
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  2. Morteza Habibi
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Correspondence to Morteza Habibi.

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Afrashteh, M., Habibi, M. Study of Dense Nitrogen Plasma Irradiation of Aluminum Targets by APF Plasma Focus Device. J Fusion Energ 31, 223–226 (2012). https://doi.org/10.1007/s10894-011-9463-7

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  • DOI: https://doi.org/10.1007/s10894-011-9463-7

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