Abstract
N-doped CuAlO2 films were prepared by RF magnetron sputtering on quartz substrates using N2O as the N source. N concentration in the films is detected by Auger electron spectroscopy in detail, which confirms that N is indeed incorporated into the films. The optical and electrical properties of transparent conductive N-doped CuAlO2 films are modulated by the N2O flow ratio in sputtering gas. The N-doped films have a visible transmittance of 60–70 % and a high infrared transmittance of ~85 %. The film deposited by using 15 % N2O flow ratio with the optimal crystalline is provided with a conductivity of 3.75 × 10−2 S cm−1 at room temperature, which improves over one order of magnitude compared with the undoped film. The enhanced conductive property is mainly originated from the ionization of acceptor impurities.
Similar content being viewed by others
References
H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, H. Hosono, Nature 389, 939 (1997)
H.M. Luo, M. Jain, T.M. McCleskey, E. Bauer, A.K. Burrell, Q.X. Jia, Adv. Mater. 19, 3604 (2007)
N. Wongcharoen, T. Gaewdang, Phys. Procedia 2, 101 (2009)
J. Luo, Y.J. Lin, H.C. Hung, C.J. Liu, Y.W. Yang, J. Appl. Phys 114, 0337121 (2013)
Th. Dittrich, L. Dloczik, T. Guminskaya, Lux-Steiner M.Ch., Appl. Phys. Lett. 85, 742 (2004)
S.J. Liu, H. Wang, J.W. Xu, M.F. Ren, L. Yang, J.H. Ju, J. Mater. Sci. Mater. El. 22, 666 (2011)
J.G. Lu, Z.Z. Ye, F. Zhuge, Y.J. Zeng, B.H. Zhao, L.P. Zhu, Appl. Phys. Lett. 85, 3134 (2004)
S.S. Pan, G.H. Li, L.B. Wang, Y.D. Shen, Y. Wang, T. Mei, X. Hu, Appl. Phys. Lett. 95, 222112 (2009)
R.D. Shannon, C.T. Prewitt, D.B. Rogers, Inorg. Chem. 10, 719 (1971)
R.S. Yu, S.C. Liang, C.J. Lu, D.C. Tasi, F.S. Shieu, Appl. Phys. Lett. 90, 191117 (2007)
J.C. Lee, S.Y. Um, Y.W. Heo, J.H. Lee, J.J. Kim, J. Eur. Ceram. Soc. 30, 509 (2010)
C.W. Teplin, T. Kaydanova, D.L. Young, J.D. Perkins, D.S. Ginley, Appl. Phys. Lett. 85, 3789 (2004)
H. Gong, Y. Wang, Y. Luo, Appl. Phys. Lett. 76, 3958 (2000)
D. Oh, Y.S. No, S.Y. Kim, W.J. Cho, K.D. Kwack, T.W. Kim, J. Alloys Compd. 509, 2176 (2011)
R.S. Yu, H.H. Yin, Thin Solid Films 526, 103 (2012)
J.L. Li, X. Wang, S.W. Shi, X.P. Song, J.G. Lv, Z.Q. Sun, J. Am. Ceram. Soc. 95, 43 (2012)
J.Q. Pan, Sh.k. Guo, X. Zhang, B.X. Feng, W. Lan, Mater. Lett. 96, 31 (2013)
A. Belafhaili, M.A. Aouaj, R. Diaz, A. Belayachi, F. Rueda, M. Abd-Lefdil, Sens. Lett. 7, 672 (2009)
W. Lan, M. Zhang, G.B. Dong, Y.Y. Wang, H. Yan, J. Mater. Res. 22, 3338 (2007)
W. Lan, W.L. Cao, M. Zhang, X.Q. Liu, Y.Y. Wang, E.Q. Xie, H. Yan, J. Mater. Sci. 44, 1594 (2009)
A.N. Banerjee, R. Maity, P.K. Ghosh, K.K. Chattopadhyay, Thin Solid Films 474, 261 (2005)
H. Katayama-Yoshida, T. Koyanagi, H. Funashima, H. Harima, A. Yanase, Solid State Commun. 126, 135 (2003)
O. Porat, I. Riess, Solid State Ionics 81, 29 (1995)
N. Serpone, J. Phys. Chem. B 110, 24287 (2006)
Acknowledgments
We greatly acknowledge the financial support obtained from the National Natural Science Foundation of China (No. 61006001 and 61176005), and the Natural Science Foundation of Gansu Province (No. 1208RJZA199), Beijing research program (No. D121100001812002) and the Project-sponsored by SRF for ROCS, SEM.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Pan, J., Lan, W., Liu, H. et al. Preparation and properties of transparent conductive N-doped CuAlO2 films using N2O as the N source. J Mater Sci: Mater Electron 25, 4004–4007 (2014). https://doi.org/10.1007/s10854-014-2121-x
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-014-2121-x